30results about How to "Good heat control effect" patented technology

The invention discloses a novel antistatic white thermal control coating and a preparation method thereof; wherein the coating, from interior to exterior, comprises a surface treatment agent layer, a prime coat layer and a finishing coat layer; the prime coat layer and the finishing coat layer all use room temperature curing type organic silicone resin as a matrix resin; a plurality of sheet-shaped metal powders are crossedly overlapped and arranged in the prime coat layer, and one ends of part of the sheet-shaped metal powders extend to the finishing coat layer; and white zinc oxide is distributed in the finishing coat layer. The coating provided by the invention is white, thickness is 100-140mum, solar absorptance is 0.24-0.29, hemispherical emissivity is 0.85-0.91, total mass loss TML is less than 1%, a collected volatile condensable material CVCM is less than 0.1%, and volume resistivity rhoV is not less than 107 ohm*m. The coating, through 100 times of high and low temperature heat cycle test in a temperature range from -100 to 100 DEG C, has advantages of non-cracking, non-spalling, non-foaming and non-discoloring phenomena, stable optical property and good adhesion force, and can basically satisfy demand of a spacecraft on the antistatic white thermal control coating.

The invention discloses a method for preparing a coating with high absorptivity and high emissivity, which relates to a method for preparing a coating. The purpose of the present invention is to solve the problem that the coating prepared by the existing magnesium-lithium alloy surface treatment technology has poor bonding force, instability, easy aging and falling off, low absorption rate and low emissivity, which are unfavorable for its application on spacecraft . Methods: 1. Pretreatment of specimens; 2. Preparation of thermal control coating with high absorption and high emissivity in silicate electrolyte system by micro-arc oxidation. The thermal control coating prepared by the invention has higher absorptivity and emissivity and good thermal control performance. The invention can obtain a coating with high absorptivity and high emissivity.

The invention provides a method for preparing a low-resistivity filler and an anti-electrostatic thermal control coating thereof. The low-resistivity filler is obtained through carrying out doping modification on zinc oxide by metal ions and carrying out high-temperature sintering aftertreatment; the anti-electrostatic thermal control coating takes polyfunctional methyl silicone resin as a matrix and the low-resistivity doping-modified zinc oxide powder as a filler, and doping-modified zinc oxide can form a conductive network in the coating. According to the anti-electrostatic thermal control coating prepared by the method, the appearance is white, the thickness is 130 to 180 microns, the solar absorption ratio is 0.22 to 0.27, the hemispherical emittance is 0.85 to 0.91, the total mass loss TML is lower than 1%, the condensable volatile matter CVCM is lower than 0.1%, the volume resistivity [rho]V is not greater than 10<7> omegam, and after the coating is subjected to -100 DEG C-to-+100 DEG C high- / low-temperature heat cycle tests for 100 times, the coating is free of cracking, peeling, blistering and discoloring phenomena and is stable in optical performance and good in adhesive power, so that the requirements of spacecrafts on anti-electrostatic white thermal control coatings are fundamentally met.

The invention discloses an electrochromic thin film device with adjustable light performance in the visible to mid-infrared band and a preparation method thereof. The preparation method comprises the following steps: S1: select a substrate, and perform pretreatment on the substrate; S2: after the treatment Prepare a high transmittance conductive layer on the substrate; S3: deposit WO on the high transmittance conductive layer 3 layer as the color change layer, then in the WO 3 Continue to deposit Ta on the layer 2 o 5 As an electrolyte layer, and then annealed to obtain crystalline WO 3 ; S4: Continue to deposit metal oxide as an ion storage layer, and then repeat step S2 on the basis of metal oxide to obtain an electrochromic thin film device; wherein, if the substrate is a transparent conductive material, the step is directly carried out on the processed substrate S3. The electrochromic thin film device obtained by this method can regulate light performance from visible to infrared light, and can design components for different wavelength bands to obtain various discoloration and heat management performances.

The invention discloses a method for heat transfer and heat dissipation with large heat and high heat flux density based on high-dimensional thermoelectricity. The temperature data acquisition / transmission module collects and transmits the real-time temperature data on the temperature detector in real time, and the control / temperature measurement module integrates the temperature detector. The time is modified in real time, the heat transfer channel in the control / temperature measurement module outputs accurate temperature signals for the collected temperature data, the external power measurement signal module analyzes and compares the output accurate temperature signals, and the high-dimensional heat dissipation matrix passes time synchronization constraints module to realize the large-area distribution control of 1~n groups of thermoelectric cooling chips; as a system-level precise temperature control technology, the present invention realizes a heat flux greater than 10^6W / cm2, a heat transfer distance of more than hundreds of meters, and a laboratory stage Precise control -196°C to 1200°C, the temperature difference between the head end and the end product is only 0.5°C, and the heat dissipation structure design can be customized.

The invention provides a silicon-containing atomic oxygen-resistant polyimide film material and a preparation method thereof. The film material includes a base film layer, a transition layer and a surface protection layer arranged in sequence; the base film layer includes a modified Polyimide matrix and nano-SiO 2 filler; the transition layer is an interpenetrating network structure of Si-O-Si and polyimide; the surface protection layer is a pure silicon dioxide layer. The atomic oxygen-resistant polyimide film prepared by the present invention is light yellow, with a thickness of 50-80 μm, a tensile strength ≥ 200 MPa, a dielectric strength ≥ 230 V / μm, and a total accumulation of atomic oxygen of 7.83×10 22 atom / cm 2 (10 years in low-Earth orbit) The mass loss rate after action is ≤10%, and the optical performance change is ≤10%. Stable performance and good mechanical properties.