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Novel alkaline polishing process

A process and a new type of technology, applied in the field of chemical polishing, can solve the problems of unreasonable alkali solution ratio, damage to polished workpieces, and reduced polishing efficiency, and achieve the effects of low cost, good effect, and simple and easy-to-control process.

Inactive Publication Date: 2020-04-28
JETION SOLAR HLDG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a novel alkali polishing process to solve the problem of using alkaline solution polishing mentioned in the above-mentioned background technology. Due to the unreasonable ratio of alkaline solution and the long soaking time, long-time soaking not only It reduces the polishing efficiency and also causes damage to the polished workpiece

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A novel alkali polishing process, comprising the steps of:

[0023] S1. Pretreatment before alkali polishing: place the workpiece to be alkali polished in a mixed solution of potassium hydroxide and hydrogen peroxide for cleaning pretreatment, then take out the pretreated workpiece, clean it with deionized water, and then wash it The workpiece is dried, wherein the mixed solution of potassium hydroxide and hydrogen peroxide is 2%wt potassium hydroxide and 1%wt hydrogen peroxide, and the cleaning pretreatment time is 3 minutes;

[0024] S2. Preparation of polishing alkali solution: add pure water, sodium hydroxide, sodium nitrite, sodium fluoride and sodium phosphate into the alkali throwing tank, wherein 65% of pure water, 30% of sodium hydroxide, 12% of sodium nitrite, fluorine 5% sodium chloride and 4% sodium phosphate, then mix the solution in the alkali throwing tank, use the heating mechanism in the alkali throwing tank to heat the solution, and prepare the alkali ...

Embodiment 2

[0028] A novel alkali polishing process, comprising the steps of:

[0029] S1. Pretreatment before alkali polishing: place the workpiece to be alkali polished in a mixed solution of potassium hydroxide and hydrogen peroxide for cleaning pretreatment, then take out the pretreated workpiece, clean it with deionized water, and then wash it The workpiece is dried, wherein the mixed solution of potassium hydroxide and hydrogen peroxide is 2%wt potassium hydroxide and 1%wt hydrogen peroxide, and the cleaning pretreatment time is 5 minutes;

[0030] S2. Preparation of polishing alkali solution: add pure water, sodium hydroxide, sodium nitrite, sodium fluoride and sodium phosphate into the alkali throwing tank, wherein 75% of pure water, 35% of sodium hydroxide, 15% of sodium nitrite, fluorine 5.5% sodium chloride and 4.5% sodium phosphate, then mix the solution in the alkali throwing tank, use the heating mechanism in the alkali throwing tank to heat the solution, and prepare the alk...

Embodiment 3

[0034] A novel alkali polishing process, comprising the steps of:

[0035] S1. Pretreatment before alkali polishing: place the workpiece to be alkali polished in a mixed solution of potassium hydroxide and hydrogen peroxide for cleaning pretreatment, then take out the pretreated workpiece, clean it with deionized water, and then wash it The workpiece is dried, wherein the mixed solution of potassium hydroxide and hydrogen peroxide is 2%wt potassium hydroxide and 1%wt hydrogen peroxide, and the cleaning pretreatment time is 5 minutes;

[0036] S2. Preparation of polishing alkali solution: add pure water, sodium hydroxide, sodium nitrite, sodium fluoride and sodium phosphate into the alkali throwing tank, wherein 85% of pure water, 40% of sodium hydroxide, 20% of sodium nitrite, fluorine 7% sodium chloride and 5% sodium phosphate, then mix the solution in the alkali throwing tank, use the heating mechanism in the alkali throwing tank to heat the solution, and prepare the alkali ...

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Abstract

The invention discloses a novel alkaline polishing process. The process comprises the following steps of S1, pretreatment before alkaline polishing, specifically, carrying out cleaning pretreatment ona workpiece to be subjected to alkaline polishing, and then drying the cleaned workpiece for later use; S2, preparation of a polishing alkaline solution, specifically, adding pure water, sodium hydroxide, sodium nitrite, sodium fluoride and sodium phosphate into an alkaline polishing tank to prepare the alkaline polishing solution; and S3, alkaline polishing treatment, specifically, putting the pretreated workpiece into the alkaline polishing tank for polishing treatment. According to the process, acid polishing is replaced with alkaline polishing, the usage amount of acid is effectively reduced, alkaline polishing waste liquid treatment is simple, low in cost and environmentally friendly compared with acid polishing waste liquid treatment, the process is simple, easy to control and low in cost, the alkaline chemical polishing solution with the reasonable proportion is adopted for polishing treatment, no harmful substance is generated in the reaction process, safety and environmentalfriendliness are achieved, and the surface of the polished workpiece is smooth.

Description

technical field [0001] The invention relates to the technical field related to chemical polishing, in particular to a novel alkali polishing process. Background technique [0002] Chemical polishing is the process of etching and leveling the parts in a specific solution. Due to the different electrochemical potentials of the constituent phases on the surface of the metal sample, many micropotentials are formed, which will produce uneven dissolution in the chemical solution. During the dissolution process, a layer of oxide film will be formed on the surface of the sample surface. Due to the thin mucous film on the protruding part of the sample surface, the dissolution and expansion speed of the metal is relatively slow. Ideally, when observing with a microscope at low and medium magnifications, such small fluctuations are generally within the vertical discrimination capability of the objective lens, and very clear tissues can still be observed; [0003] Common chemical polis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/00
CPCC23F3/00
Inventor 胡燕王海庆曹思远
Owner JETION SOLAR HLDG