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Flexible nanofiber gallium tin oxide transistor based on nano-cluster dielectric layer and preparation method

A technology of nanofibers and gallium oxide, applied in transistors, nanotechnology for information processing, nanotechnology, etc., can solve the problems of difficult control of the direction and quantity of nanofibers, and achieve large-scale industrial applications, high uniformity, The effect of simple and convenient operation

Pending Publication Date: 2020-04-28
XIAN JIAOTONG LIVERPOOL UNIV
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Problems solved by technology

[0005] In order to solve the above-mentioned technical problems, the object of the present invention is to propose a flexible nanofiber gallium tin oxide transistor based on a nano-cluster dielectric layer and a preparation method thereof. The nanofiber structure is prepared by using an inorganic metal oxide material. In the preparation process, the method of brushing is used to improve the difficulty of controlling the direction and quantity of nanofibers in the traditional process, and it has the advantages of simple process and low cost

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Embodiment Construction

[0042] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in combination with specific embodiments and with reference to the accompanying drawings. It should be understood that these descriptions are exemplary only, and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.

[0043] Such as figure 1 As shown, the present invention discloses a flexible nanofiber gallium tin oxide transistor based on a nanocluster dielectric layer, including a top electrode layer stacked from top to bottom, a carrier channel layer 102 of a nanofiber structure, a dielectric layer 103, bottom gate electrode layer 104 and flexible transparent substrate 105, the upper electrode layer includes source and drain elect...

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Abstract

The invention discloses a flexible nanofiber gallium tin oxide transistor based on a nano-cluster dielectric layer and a preparation method. The flexible nanofiber gallium tin oxide transistor disclosed by the invention comprises a top source electrode layer, a top drain electrode layer, a carrier channel layer of a nanofiber structure, a nano-cluster structure dielectric layer, a bottom gate electrode layer and a substrate which are sequentially arranged in a stacked mode from top to bottom, wherein the carrier channel layer of the nanofiber structure is a gallium tin oxide filament cluster with the diameter of 100-200nm, and is prepared based on a sol method. The nanofiber structure is prepared by adopting an inorganic metal oxide material, the problem that the direction and quantity ofnanofibers are not easy to control in the traditional process is solved by utilizing a brushing method in the preparation process, and the advantages of simple process and low cost are achieved. The FET device prepared based on the method has good electrical properties, and is beneficial to further application in large-scale circuit design.

Description

technical field [0001] The invention relates to the technical field of field effect transistors, in particular to a flexible nanofiber gallium tin oxide transistor based on a nanocluster dielectric layer and a preparation method thereof. Background technique [0002] In recent years, with the increasing demand for advanced electronic devices, field-effect transistor (FET) devices have gradually attracted a lot of research and are regarded as one of the most critical basic devices in modern electronic device applications. . [0003] One-dimensional nanostructured devices, such as nanofibers (NFs), etc., are currently Has been called a research hotspot. The NF structure FET channel layer is one or several fibrous semiconductor nano-filaments, which can effectively reduce the scattering of carriers and form an effective conductive channel compared with the traditional thin-film structure FET. However, the traditional processes for preparing NF, such as: electrospinning, evap...

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Application Information

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IPC IPC(8): H01L29/786H01L21/34B82Y10/00
CPCH01L29/7869H01L29/66969H01L21/34B82Y10/00
Inventor 赵天石赵春赵策洲杨莉仇成虎冯江帆
Owner XIAN JIAOTONG LIVERPOOL UNIV
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