Low roll-off quasi-two-dimensional perovskite light-emitting diode and its preparation method
A technology of light-emitting diodes and perovskites, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as poor film quality, many film grain boundaries, and device efficiency roll-off, and achieve low cost, Effects of suppressing non-radiative recombination and suppressing efficiency roll-off
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0050] In this example, see figure 1, a low-roll-off quasi-two-dimensional perovskite light-emitting diode, in which an anode 1, a hole transport layer 2, an interface modification layer 3 between the hole transport layer and the light-emitting layer, a perovskite light-emitting layer 4, and a light-emitting layer are sequentially arranged from bottom to top Layer and electron transport interface modification layer 5, electron transport layer 6, electron injection layer 7, cathode 8;
[0051] The thickness of the anode 1 is 150nm, and the gate 1 adopts an ITO conductive glass film; the thickness of the hole transport layer 2 is 50nm, and the hole transport layer 2 is made of PEDOT:PSS; the hole The thickness of the interface modification layer 3 between the transmission layer and the light-emitting layer is 10nm, and cesium carbonate (Cs 2 CO 3 ) is made; the thickness of the perovskite light-emitting layer 4 is 100nm; the thickness of the light-emitting layer and the electr...
Embodiment 2
[0075] This embodiment is basically the same as Embodiment 1, especially in that:
[0076] In this example, see figure 1 , a low-roll-off quasi-two-dimensional perovskite light-emitting diode, in which an anode 1, a hole transport layer 2, an interface modification layer 3 between the hole transport layer and the light-emitting layer, a perovskite light-emitting layer 4, and a light-emitting layer are sequentially arranged from bottom to top Layer and electron transport interface modification layer 5, electron transport layer 6, electron injection layer 7, cathode 8;
[0077] The thickness of the anode 1 is 100nm, and the gate 1 adopts an ITO conductive glass film; the thickness of the hole transport layer 2 is 40nm, and the hole transport layer 2 is made of PEDOT:PSS; the hole The thickness of the interface modification layer 3 between the transmission layer and the light-emitting layer is 1nm, and cesium carbonate (Cs 2 CO 3 ) is made; the thickness of the perovskite ligh...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com