Ignition gas distribution ring for arc plasma torch

An arc plasma and gas distribution technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of limiting diamond quality and further improvement of performance, etc., to achieve lower temperature, simple structure, prevent deformation effect

Pending Publication Date: 2020-05-29
杨卫正
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing arc plasma torch gas outlet structure limits the further improvement of diamond quality and performance

Method used

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  • Ignition gas distribution ring for arc plasma torch
  • Ignition gas distribution ring for arc plasma torch
  • Ignition gas distribution ring for arc plasma torch

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Embodiment 1 adopts Figure 1-2 The distribution ring structure, the installation method is as follows Figure 5 shown. The cathode 5 is made of tungsten rod, the first anode 7 is made of copper, the gas distribution ring with an outer diameter of 42 mm is arranged on the same plane, and six tangential holes 201 with a diameter of 1.5 mm are evenly and symmetrically arranged, and the ignition gas is a protective Gas argon, the flow rate of argon is 2.5 liters per minute, the main gas is composed of argon, hydrogen and LPG and other gases, the working voltage is 110V, the current is 165A, and the voltage has been stable at 110V+ / -0.5V during the continuous operation of 250 hours , as shown in Table 1, indicating that the cathode working state is very stable throughout the process. Figure 6 It is the Raman spectrum of diamond produced by this deposition equipment, only 1332cm -1 The sharp diamond peak at the position shows that there is no metal impurity in the diamon...

Embodiment 2

[0033] Embodiment 2 adopts the same parameter conditions as Embodiment 1, wherein the channel of the tangential hole of the distribution ring is arranged obliquely along the tangential direction, that is, the axis of the channel of the tangential hole and the axis of the ring body of the distribution ring form an included angle of 75°. During 250 hours of continuous operation, the voltage has been stable at 110V+ / -0.3V, and the voltage stability has been further improved, which is more conducive to arc stability and electrode life, and avoids metal evaporation and diamond pollution.

[0034] Table 1 Voltage values ​​at different time points during diamond production

[0035]

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Abstract

The invention discloses an ignition gas distribution ring for an arc plasma torch. The ignition gas distribution ring is provided with an upper ring body, a middle ring body and a lower ring body. Theupper surface of the upper ring body is a special-shaped surface with a convex-concave structure and can be matched with the lower end face of an insulation sleeve. The lower surface of the lower ring body is provided with a conic face matched and pressed with an outer anode. Multiple tangential holes are evenly formed in the middle ring body around the axis, and air flow flowing out of the ringbody of the distribution ring is guided into the ring body of the distribution ring by the tangential holes to flow out. The ignition gas distribution ring is independent of the insulation sleeve andis independently fixed to the bottom of the insulation sleeve, a stable gas outlet distribution structure can be provided for gas, long-time stable rotary gas flow can be formed, stability of arcs andvoltages is improved, and the ignition gas distribution ring is especially suitable for deposition preparation of diamond materials.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition equipment, in particular to an ignition gas distribution ring for an arc plasma torch, which is especially suitable for the preparation of diamond coatings and diamond films. Background technique [0002] Plasma torch is an important device for vapor deposition to prepare single crystal material, polycrystalline material or thin film material. The arc plasma torch is one of the specific types of this type of device. Its structure generally has a cathode and at least one anode. An arc can be formed between the cathode and the anode by applying a DC voltage and high frequency and high voltage. Between at least one adjacent electrode It has an air inlet channel, and the outlet end of the air inlet channel is provided with a structure that can make the gas form a rotating air flow, and the rotating air flow drives the arc anode spot to rotate at a high speed to form a rotating arc, s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/27C23C16/503
CPCC23C16/275C23C16/503
Inventor 杨卫正
Owner 杨卫正
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