Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for adjusting beam divergence angle of vertical cavity surface emitting semiconductor laser

A technology of vertical cavity surface emission and beam divergence angle, applied in the direction of semiconductor lasers, lasers, laser components, etc., can solve the problems that the current density affects the reliability of VCSEL, the light-emitting area limits the maximum output power of VCSEL, etc., to ensure the maximum output power and reliability effects

Active Publication Date: 2020-06-05
江西德瑞光电技术有限责任公司
View PDF14 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But for smaller oxidation holes, the reduced light-emitting area limits the maximum output power of VCSEL, and at the same time, the high current density also affects the reliability of VCSEL

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for adjusting beam divergence angle of vertical cavity surface emitting semiconductor laser
  • Method for adjusting beam divergence angle of vertical cavity surface emitting semiconductor laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] The implementation of the present invention will be described in detail below with reference to the drawings and examples, so as to fully understand and implement the implementation process of how to use technical means to solve technical problems and achieve technical effects in the present invention.

[0016] A method for adjusting the beam divergence angle of a vertical cavity surface-emitting semiconductor laser, using epitaxial technology to sequentially grow an N-type semiconductor reflective layer, an active layer, and a P-type semiconductor reflective layer on a semiconductor substrate; the N-type semiconductor reflective layer and the P The type semiconductor reflection layer is a plurality of pairs of distributed Bragg mirror layers composed of two semiconductor materials with different refractive indices;

[0017] The P-type semiconductor DBR has a reduced logarithm;

[0018] A certain logarithm of the dielectric DBR layer is fabricated on the P-type semicond...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for adjusting a beam divergence angle of a vertical cavity surface emitting semiconductor laser. An N-type semiconductor reflecting layer, an active layer and a p-typesemiconductor reflecting layer sequentially growing on a semiconductor substrate by using an epitaxial technology, the N-type semiconductor reflecting layer and the P-type semiconductor reflecting layer are multiple pairs of distributed Bragg reflector layers composed of two semiconductor materials with different refractive indexes, and a P-type semiconductor DBR has a reduced number of pairs. Acertain number of dielectric DBR layers are manufactured on the P-type semiconductor reflecting layer, and the divergence angle of a VCSEL is adjusted by adjusting the transverse size of the dielectric DBR layer. According to the method, the divergence angle of the VCSEL can be adjusted on the basis of maintaining a larger oxidation hole diameter.

Description

technical field [0001] The invention relates to the technical field of semiconductor lasers, in particular to a method for adjusting the beam divergence angle of a vertical cavity surface emitting semiconductor laser. Background technique [0002] A vertical cavity surface emitting laser is a type of semiconductor laser. A conventional VCSEL forms a VCSEL by sequentially forming a first mirror layer, an active layer, and a second mirror layer on a substrate material. The first and second reflector layers are distributed Bragg reflector (DBR) semiconductor layers formed by alternating high and low refractive index materials. Taking GaAs-based VCSEL as an example, the substrate material is generally N-type GaAs material, the first mirror is an N-type semiconductor layer of AlxGa1-xAs with two different Al compositions, the active layer is a multi-quantum well structure, and the second The mirror layer is an AlxGa1-xAs N-type semiconductor layer with two different Al compositi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/183
CPCH01S5/183H01S5/18361H01S5/18377
Inventor 徐化勇仇伯仓高阳蒋锴
Owner 江西德瑞光电技术有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com