Metal aesthetic arch wire for orthodontics and preparation method thereof
A technology for orthodontics and metal, applied in the direction of arch wire, metal material coating process, ion implantation plating, etc., can solve the problems of easy falling off of aesthetic coating, weak corrosion ability of arch wire, poor color stability, etc., and achieve controllable Film thickness, ease of sputtering, low cost effects
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Embodiment 1
[0035] In this experiment, an Al-SiO2 aesthetic composite coating was prepared based on the aesthetic appearance of the aluminum coating and the corrosion resistance, low friction, and wear resistance of silicon dioxide to realize the combination of aesthetics and function. The coating method specifically includes the following steps:
[0036] Step 1: Preparation of aluminum white film by magnetron sputtering coating
[0037] (1) Unbalanced magnetron sputtering coating equipment
[0038] (2) Membrane structure: nickel titanium or stainless steel arch wire / aluminum
[0039] (3) Preparation of coating process:
[0040] The film thickness of the first layer (aluminum) is about 0.3 microns;
[0041] Coating vacuum (3×10 -3 Pa);
[0042] Coating temperature (250°C);
[0043] Argon pressure (0.5pa);
[0044] Aluminum pre-sputtering time 15min;
[0045] Aluminum coating time 10min;
[0046] Aluminum target pulse voltage 350V;
[0047] Substrate voltage 340V;
[0048] Step ...
Embodiment 2
[0092] Step 1: Preparation of aluminum white film by magnetron sputtering coating
[0093] (1) Unbalanced magnetron sputtering coating equipment
[0094] (2) Film structure: arch wire / aluminum
[0095] (3) Preparation of coating process:
[0096] The film thickness of the first layer (aluminum) is about 0.3 microns;
[0097] Coating vacuum (3×10 -3 Pa);
[0098] Coating temperature (250°C);
[0099] Argon pressure (0.5pa);
[0100] Aluminum pre-sputtering time 15min;
[0101] Aluminum coating time 10min;
[0102] Aluminum target pulse voltage 350V;
[0103] Substrate voltage 340V;
[0104] Step 2: Preparation of transparent silicon dioxide film by magnetron sputtering coating
[0105] (1) Unbalanced magnetron sputtering coating equipment
[0106] (2) Film structure: arch wire / aluminum / silicon dioxide
[0107] (3) Preparation of coating process:
[0108] The film thickness of the second layer (silicon dioxide) is about 1.6 microns;
[0109] Coating vacuum (3×10 -...
Embodiment 3
[0117] Step 1: Preparation of aluminum white film by magnetron sputtering coating
[0118] (1) Unbalanced magnetron sputtering coating equipment
[0119] (2) Film structure: arch wire / aluminum
[0120] (3) Preparation of coating process:
[0121] The film thickness of the first layer (aluminum) is about 0.3 microns;
[0122] Coating vacuum (3×10 -3 Pa);
[0123] Coating temperature (250°C);
[0124] Argon pressure (0.5pa);
[0125] Aluminum pre-sputtering time 15min;
[0126] Aluminum coating time 10min;
[0127] Aluminum target pulse voltage 350V;
[0128] Substrate voltage 340V;
[0129] Step 2: Preparation of transparent silicon dioxide film by magnetron sputtering coating
[0130] (1) Unbalanced magnetron sputtering coating equipment
[0131] (2) Film structure: arch wire / aluminum / silicon dioxide
[0132] (3) Preparation of coating process:
[0133] The film thickness of the second layer (silicon dioxide) is about 1.6 microns;
[0134] Coating vacuum (3×10 -...
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