Controllable processing method and device for nanopore array based on optical control

Abstract

The invention discloses a controllable processing method and device of a nanopore array based on optical control. The method comprises the following steps: (1) spin-coating a hexadecyl trimethyl ammonium chloride layer on the upper surface of a cleaned silicon wafer, (2) self-assembling a layer of gold nanoparticles on the upper surface of the silicon wafer subjected to the step (1), (3) dispersing an array laser beam through a multi-beam galvanometer, and (4) performing optical manipulation on each gold nanoparticle through a single laser beam so as to enable each gold nanoparticle to move toa corresponding target position. The limitation of Van der Waals' force during self-assembly of the gold nanoparticles is overcome, according to the method, the customized gold nanoparticle array isaccurately processed at the designated position, and the high-quality silicon nanopore array is efficiently processed through metal-assisted chemical etching, so that the defects of large required process experiment workload, high hole site adjustment difficulty and the like of the conventional nanopore array etching technology are overcome, and the method has a wide application prospect.

Description

technical field [0001] The invention relates to the field of processing solid-state nanohole arrays, in particular to a controllable processing method and device for nanohole arrays based on optical manipulation. Background technique [0002] With the development of nanoscience and technology, the application of nanopore sensors in the fields of gene sequencing and energy conversion has made great progress. Solid-state nanopores have attracted the interest of many researchers due to their stable performance, controllable geometry and excellent robustness. At present, the field of single nanopore processing is relatively mature, but there are still many challenges for nanopore arrays that meet commercial applications such as gene sequencing, such as high processing costs, low efficiency, and poor controllability. Therefore, it is urgent to propose new methods to accurately process high-quality solid-state nanohole arrays, so as to accelerate the industrialization of solid-st...

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Problems solved by technology

Chinese patent CN102732885A proposes a magnetic field-assisted micro-nano processing technology, which transfers the required pattern through the photolithography process, then coats the metal for catalysis, adds an etching solution, and places it in a magnetic field environment with adjustable magnetic field strength and direction. Etching, due to the

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