Low temperature plasma device and method of decomposing hydrogen sulfide
A low-temperature plasma, hydrogen sulfide technology, applied in the field of ion chemistry, can solve the problems of high decomposition energy consumption and low hydrogen sulfide conversion rate
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Embodiment 1
[0112] use figure 1 The shown low-temperature plasma reaction equipment performs hydrogen sulfide decomposition reaction. The specific structure and structural parameters of the low-temperature plasma reaction equipment are as follows. The internal electrode of this embodiment is a high-voltage electrode:
[0113] Reaction equipment includes:
[0114] A first cavity, the first cavity is respectively provided with a first inlet, a gas product outlet, and a liquid product outlet, wherein all side walls of the first cavity are formed of a barrier medium to form the barrier medium The material is hard glass;
[0115] A second cavity, the second cavity is nested inside the first cavity, and a second inlet and a second outlet are respectively provided on the second cavity; the side walls of the second cavity are both It is formed by an internal electrode, the material for forming the internal electrode is stainless steel, and the internal electrode is connected to a high voltage power su...
Embodiment 2
[0143] In this embodiment, a plasma reaction equipment similar to that in embodiment 1 is used to carry out the decomposition reaction of hydrogen sulfide. The difference is that in this embodiment:
[0144] All side walls of the first cavity are formed by external electrodes, the material for forming the external electrodes is stainless steel metal foil, the external electrodes are connected to a high-voltage power supply, and the internal electrodes are grounded;
[0145] The blocking medium is arranged around the inner side wall of the first cavity;
[0146] L 2 And the thickness of the blocking medium D 1 The ratio of is 8:1; and H 1 : L 3 = 1:50.
[0147] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reaction equipment from the first inlet 2 S / Ar mixture, where H 2 The volume fraction of S is 30%, and the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge zone is 9.4 s. In this embodimen...
Embodiment 3
[0151] In this embodiment, a plasma reaction equipment similar to that in embodiment 1 is used to carry out the decomposition reaction of hydrogen sulfide. The difference is that in this embodiment:
[0152] All the side walls of the first cavity are formed by external electrodes, the material for forming the external electrodes is copper foil, the external electrodes are grounded, and the internal electrodes are connected to a high-voltage power supply;
[0153] The blocking medium is arranged around the inner side wall of the first cavity;
[0154] L 2 And the thickness of the blocking medium D 1 The ratio of is 20:1; and H 1 : L 3 =1:120.
[0155] In this embodiment, H is introduced into the first cavity of the low-temperature plasma reaction equipment from the first inlet 2 S / Ar mixture, where H 2 The volume fraction of S is 25%, the flow rate of the mixed gas is controlled so that the average residence time of the gas in the discharge zone is 17.6s, and the reaction pressure in th...
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