Sulfur dioxide sensor based on organic field effect transistor and preparation method thereof
A sulfur dioxide and transistor technology, applied in the field of sulfur dioxide sensor and its preparation, can solve the problems of poor device life, low sensitivity, low integration, etc., and achieve the effects of reducing defect state density, improving overall performance, and enhancing stability
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Embodiment 1
[0033] Such as figure 1 As shown, a sulfur dioxide sensor based on an organic field effect transistor includes a substrate, a gate electrode, a gate insulating layer, an organic semiconductor layer, a source electrode, and a drain electrode, and the organic semiconductor layer is arranged between the source electrode and the drain electrode. There is an ultrathin anthocyanin-coenzyme Q10 composite layer, and the organic semiconductor material is a soluble organic semiconductor material.
[0034] Its preparation method is as follows:
[0035] S1: Thoroughly clean the glass substrate on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0036] S2: Prepare PS film on ITO by spin coating method to form gate insulating layer 100nm;
[0037] S3: heat and bake the spin-coated PS film;
[0038] S4: Spin-coat P3HT organic semiconductor layer 100nm on the gate insulating layer;
[0039] S5: Prepare an ultra-thin anthocyanin-coenzyme Q10 c...
Embodiment 2
[0043] Such as figure 1 As shown, a sulfur dioxide sensor based on an organic field effect transistor includes a substrate, a gate electrode, a gate insulating layer, an organic semiconductor layer, a source electrode, and a drain electrode, and the organic semiconductor layer is arranged between the source electrode and the drain electrode. There is an ultrathin anthocyanin-coenzyme Q10 composite layer, and the organic semiconductor material is a soluble organic semiconductor material.
[0044] Its preparation method is as follows:
[0045] S1: thoroughly clean the glass substrate 1 on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0046] S2: adopt spin-coating method to prepare PMMA thin film on ITO and form gate insulating layer 520nm;
[0047] S3: heat and bake the spin-coated PMMA film;
[0048] S4: spin-coat Tips-pentacene organic semiconductor layer 150nm on the gate insulating layer;
[0049] S5: Prepare an ultra-thi...
Embodiment 3
[0053] Such as figure 1 As shown, a sulfur dioxide sensor based on an organic field effect transistor includes a substrate, a gate electrode, a gate insulating layer, an organic semiconductor layer, a source electrode, and a drain electrode, and the organic semiconductor layer is arranged between the source electrode and the drain electrode. There is an ultrathin anthocyanin-coenzyme Q10 composite layer, and the organic semiconductor material is a soluble organic semiconductor material.
[0054] Its preparation method is as follows:
[0055] S1: thoroughly clean the glass substrate 1 on which the gate electrode ITO has been sputtered, and dry it with dry nitrogen after cleaning;
[0056] S2: Prepare a PVA film on the ITO by spin coating to form a gate insulating layer of 20nm;
[0057] S3: heat and bake the spin-coated PVA film;
[0058] S4: Spin-coat Tips-pentacene organic semiconductor layer 200nm on the gate insulating layer;
[0059] S5: Prepare an ultra-thin anthocyan...
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