Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

3-pentadecyl-phenol phenolic resin as well as preparation method and application thereof

A technology of pentadecylphenol and phenolic resin, which is applied in the direction of photosensitive materials used in optomechanical equipment, etc., and can solve the problems of low sensitivity and poor solubility of the composition

Active Publication Date: 2020-08-25
YELLOW RIVER CONSERVANCY TECHN INST
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the commonly used thermoplastic phenolic resin and alkali-soluble polymer compositions in the prior art have some problems: such as high alkali resistance, but low sensitivity; strong solvent resistance and high abrasion resistance, but poor solubility of the composition

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • 3-pentadecyl-phenol phenolic resin as well as preparation method and application thereof
  • 3-pentadecyl-phenol phenolic resin as well as preparation method and application thereof
  • 3-pentadecyl-phenol phenolic resin as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-10

[0057] Embodiment 1-10 is the specific synthetic example of special phenolic resin:

Embodiment 1

[0058] The synthesis of the pentadecylphenol type phenolic resin (P1) between embodiment 1

[0059] In a four-necked flask equipped with a stirrer and a thermometer, put 142g of m-pentadecylphenol, 22g of phenol, 25g of m-cresol, 25g of p-cresol, 1g of oxalic acid and 50g of formaldehyde solution with a mass of 37%, heat up, stir and heat The mixture was refluxed for 30min. Add 1 gram of oxalic acid and continue to reflux for 1 hour. After cooling, let stand for 30 minutes to siphon out the upper layer of water, then vacuum distill and heat to raise the temperature in the bottle to 120°C to obtain m-pentadecylphenol-type phenolic resin (P1). 208g. The GPC measurement results of the phenolic resin (P1) are: the number average molecular weight (Mn) is 2825, the weight average molecular weight (Mw) is 7680, and the polydispersity index (Mw / Mn)=2.719.

Embodiment 2

[0060] The synthesis of the pentadecylphenol type phenolic resin (P2) between embodiment 2

[0061] In a four-necked flask equipped with a stirrer and a thermometer, 160 g of m-pentadecylphenol, 20 g of phenol, 17 g of p-cresol, 17 g of m-cresol, 4 grams of zinc acetate, 50 g of aqueous formaldehyde solution of 37% quality and 1 g of oxalic acid were added. 0.5g of p-toluenesulfonic acid, stirred and heated the mixture, and refluxed for 30min. Add 1 gram of oxalic acid, and continue to reflux for 1 hour. After cooling, let stand for 30 minutes to siphon out the upper layer of water, and then vacuum distill and heat to raise the temperature in the bottle to 120°C to obtain m-pentadecylphenol-type phenolic resin (P2). 190g. The GPC measurement results of the phenolic resin (P2) are: the number average molecular weight (Mn) is 5080, the weight average molecular weight (Mw) is 11630, and the polydispersity index (Mw / Mn)=2.289.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
emission peakaaaaaaaaaa
polydispersity indexaaaaaaaaaa
polydispersity indexaaaaaaaaaa
Login to View More

Abstract

The invention particularly relates to 3-pentadecyl-phenol phenolic resin and a preparation method thereof. The phenolic resin is used for preparing a lithographic printing plate material. Compared with other resins, the special phenolic resin with a 3-pentadecyl-phenol structure has the advantages that the phenolic resin has a C15 long-chain structure at the meta-position of phenolic resin, so that the spatial free volume of the phenolic resin is large, and the phenolic resin has good intermolecular interaction with other components in a composition to generate good dissolving performance andrequired alkali resistance, solvent resistance and wear resistance. A lithographic printing plate material prepared from an infrared sensitive composition of the phenolic resin has good resistance toisopropanol erosion, and is not easily eroded and dissolved by printing chemicals in the use process, thereby being beneficial to prolonging the service life of the lithographic printing plate.

Description

technical field [0001] The invention specifically relates to a m-pentadecylphenol phenolic resin and a preparation method thereof, and uses the phenolic resin to prepare lithographic printing plates. Background technique [0002] Imageable elements used to prepare lithographic printing plates generally comprise one or more positive-working imageable layers comprising a phenolic resin and a plurality of radiation-sensitive components. After radiation imaging, the exposed areas of the imageable layer are removed by a suitable developer, exposing the underlying hydrophilic surface of the support. The areas of the imageable layer that are not removed by development are the ink receptive areas; while the hydrophilic surface exposed by the development process accepts water or an aqueous solution (usually a fountain solution) and repels ink. [0003] The radiation-sensitive components of prior art imageable elements used in positive-working platemaking have generally been imageab...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08G8/24C08G8/12C08G8/10G03F7/004G03F7/11
CPCC08G8/24C08G8/12C08G8/10G03F7/004G03F7/11
Inventor 刘伟王国英马金菊方瑞娜王宗舞耿悦庞宏建崔虹张盟
Owner YELLOW RIVER CONSERVANCY TECHN INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products