Preparation method of X-ray multilayer film reflector

A multi-layer film and X-ray technology, applied in the application of diffraction/refraction/reflection processing, coating, radiation/particle treatment, etc., can solve the problems that are difficult to prepare multi-layer film mirrors with higher periodic thickness and small size, and achieve The effect of small roughness, clear interface and less diffusion

Inactive Publication Date: 2020-08-25
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Claims
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Problems solved by technology

At present, the periodic thickness of the thin film prepared is several nanometers, so the prepared multilayer film mirror is mainly used in the soft X-ray band with a longer wavelength. For the X-ray band with a shorter wavelength, it is difficult to prepare a smaller periodic thickness by existing methods. multilayer mirror

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  • Preparation method of X-ray multilayer film reflector
  • Preparation method of X-ray multilayer film reflector
  • Preparation method of X-ray multilayer film reflector

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preparation example Construction

[0037] The invention provides a kind of preparation method of X-ray multilayer film reflector, comprises the following steps:

[0038] (1) according to the wavelength of X-ray and the angle of incidence, determine the periodic thickness of multilayer film reflector; The period of described multilayer film reflector is counted with the period of double-layer film, and described double-layer film is spacer layer thin film and Absorbing layer film; the periodic thickness is the thickness of the double-layer film;

[0039](2) according to the maximization of the X-ray reflectivity, determine the thickness ratio of the spacer layer film and the absorption layer film and the period number of the double-layer film;

[0040] (3) According to the thickness ratio determined in the step (2) and the periodic thickness determined in the step (1), obtain the thickness of the spacer layer film and the thickness of the absorption layer film, then determine according to the thickness and depos...

Embodiment 1～8

[0066] According to the parameters listed in Table 1, different X-ray multilayer film mirrors are prepared according to the following methods:

[0067] (1) according to the wavelength of X-ray and the angle of incidence, according to formula d=nλ / (2cosθ), determine the period thickness of multilayer reflector; The double-layer film is respectively a spacer layer film and an absorption layer film; the periodic thickness is the thickness of the double-layer film;

[0068] (2) According to the maximization of the X-ray reflectivity, determine the thickness ratio of the spacer layer film and the absorber layer film and the cycle number of the double-layer film, and the specific data are shown in Table 1;

[0069] (3) According to the thickness ratio of the spacer layer film and the absorber layer film and the periodic thickness of the multilayer film reflector, obtain the thickness of the spacer layer film and the thickness of the absorber layer film, then according to the thickne...

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Abstract

The invention provides a preparation method of an X-ray multilayer film reflector, and belongs to the technical field of multilayer film reflectors. The method comprises the following steps of firstly, determining the periodic thickness of an X-ray multilayer film according to the wavelength and the incident angle of X-rays; then determining the thickness and the periodic number of the multilayerfilm; and conducting alternately depositing on the surface of a substrate by using an atomic layer deposition method to prepare the X-ray multilayer film reflector. According to the preparation method, the periodic thickness of the X-ray multilayer film is small, the X-ray multilayer film reflector with shorter wavelength can be prepared, in addition, the roughness of the prepared multilayer filmis small (which is less than or equal to the roughness of the substrate), the interface among films is clear, and the reflectivity of the multilayer film reflector is high.

Description

technical field [0001] The invention relates to the technical field of multilayer film reflectors, in particular to a preparation method of an X-ray multilayer film reflector. Background technique [0002] Since its discovery in 1895, X-rays have been widely used due to their unique properties, such as X-ray astronomical telescopes, X-ray diffraction by synchrotron radiation, and X-ray imaging. X-ray multilayer mirror is an important X-ray optical component, which can greatly improve the reflectivity of X-rays under non-grazing incidence conditions, which is helpful for reducing the size of the optical system, reducing the difficulty of installation and improving the imaging quality etc. are of great significance. [0003] At present, the preparation methods of X-ray multilayer mirrors are mainly magnetron sputtering and electron beam thermal evaporation. It is difficult to control the thickness and roughness of the film, the diffusion between films is not easy to control, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/455C23C16/06C23C16/34C23C16/40G21K1/06
CPCC23C16/45529C23C16/06C23C16/34C23C16/405C23C16/407C23C16/40C23C16/303C23C16/402C23C16/403G21K1/062
Inventor 李艳丽孔祥东韩立姚广宇董增雅
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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