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A controllable fine-tuning method for linear density distribution of variable-pitch grating mask

A technology of variable pitch grating and line density, applied in the directions of diffraction grating, optics, optical components, etc., can solve the problems of high price and cannot change the line density and spatial distribution of the grating, so as to reduce dependence and improve production quality and efficiency. Effect

Active Publication Date: 2021-10-22
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method mainly solves the problem that the conventional near-field holography method cannot change the grating line density and its spatial distribution, and that the expensive phase mask needs to be remade by electron beam lithography after the phase mask is worn out.

Method used

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  • A controllable fine-tuning method for linear density distribution of variable-pitch grating mask
  • A controllable fine-tuning method for linear density distribution of variable-pitch grating mask
  • A controllable fine-tuning method for linear density distribution of variable-pitch grating mask

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Effect test

Embodiment 1

[0033] Step (1), such as figure 1 As shown, a near-field holographic exposure system is established. The holographic exposure system includes an ultraviolet band laser with a wavelength of 325nm, a pinhole, a collimating lens, a fused silica phase mask, a grating substrate coated with photoresist, and a turntable. The fused silica phase mask and the grating substrate are placed on the turntable, and the grating-free surface of the fused silica phase mask and the grating substrate coated with photoresist are filled with a refractive index matching liquid (exposure mode I), and the ultraviolet band laser The emitted light passes through the pinhole and the collimating lens in turn to form parallel light, and irradiates the variable-pitch grating pattern on the fused silica phase mask at a certain incident angle θ to produce zero-order and negative-order diffracted light. The overlapping regions of the negative first-order diffracted light on the photoresist substrate interfere w...

Embodiment 2

[0046] Step (1), such as Image 6As shown, a near-field holographic exposure system is established. The holographic exposure system includes an ultraviolet band laser with a wavelength of 325nm, a pinhole, a collimating lens, a fused silica phase mask, a grating substrate coated with photoresist, and a turntable. The fused silica phase mask and the grating substrate are placed on the turntable. There is an air gap between the grating pattern surface of the fused silica phase mask and the grating substrate coated with photoresist (exposure method II), and the light emitted by the ultraviolet band laser is sequentially After passing through the pinhole and collimating lens, parallel light is formed, and the variable-pitch grating pattern irradiated on the fused silica phase mask at a certain incident angle θ produces zero-order and negative-order diffracted light. The overlapping regions of light on the photoresist substrate interfere with each other to form a variable-pitch pho...

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Abstract

The invention discloses a controllable and fine-tuning method for the linear density distribution of a variable-pitch grating mask, which solves the problem that the conventional near-field holographic method cannot directly copy and fine-tune the linear density of the mask and its spatial distribution. By fine-tuning the near-field holographic exposure parameters and introducing a transition mask, a series of variable-pitch grating masks with the same linear density or a certain offset from the initial mask linear density distribution are realized. The present invention can effectively fine-tune the linear density distribution of the near-field holographic variable-pitch grating phase mask, thereby reducing the dependence on the electron beam lithography manufacturing method, reducing the manufacturing cost of the phase mask, and to a certain extent, obtaining flexible and fast Masks with different linear density distributions to meet different requirements in different occasions are a very important and low-cost method for manufacturing variable-pitch gratings. The invention is very important for regulating the spatial distribution of grating linear density by using the near-field holographic method, and improving the manufacturing quality and efficiency of the high-precision variable-pitch grating on the basis of this.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing of diffractive optical elements, and in particular relates to a controllable fine-tuning method for the linear density distribution of a variable-pitch grating mask, which is a variable-pitch grating based on near-field holographic technology and a controllable linear density of its phase mask. fine-tuning method. Background technique [0002] Near-field holography is a fast and stable method for making diffraction gratings, especially variable-pitch gratings. The basic principle is: after the laser used in near-field holographic exposure passes through the phase mask, the pattern of the phase mask is transferred to the coated photoresist by using the interference between the two diffraction orders of the incident light by the phase mask. On the grating substrate, the pattern of the photoresist grating is transferred to the grating substrate through the etching process. The phase m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 刘颖林达奎陈火耀刘正坤洪义麟
Owner UNIV OF SCI & TECH OF CHINA