A specifically tunable high-throughput ultra-diffraction-limited focal spot generation device

Abstract

The invention discloses a specific controllable high-flux ultra-diffraction-limited focal spot generating device. The device first generates laser light for generating high-flux dark spots, and then incidents it on a spatial modulator loaded with a diffraction phase to generate laser light for generating high-flux dark spots. The beam is split into a multi-channel laser array, which is then incident on the microlens array and focused. At the same time, the beam array is filtered on the Fourier surface of the microlens array, and then the beam array is incident on a high-flux dark spot to generate Phase modulation is performed on the device, and finally the beam array is focused to produce a high-throughput dark spot. The invention has compact design and high integration; can generate high-flux ultra-diffraction-limited focal spot while realizing high-speed specific regulation of dark spot; can be used to realize parallel stimulated emission loss microscopic imaging and high-throughput double-beam laser Direct-write lithography can achieve sub-50nm resolution of parallel systems, improve system speed, and ensure the simultaneous and stable improvement of laser direct-write processing speed and imaging resolution.

Description

technical field [0001] The invention belongs to the field of optical engineering, in particular to a specific controllable high-throughput ultra-diffraction-limited focal spot generating device. Background technique [0002] Laser 3D printing and processing technology is a technology with micron processing accuracy and 3D printing capability. Mechanical, electronic and optical devices with corresponding scale structures can be fabricated flexibly. At the same time, the processing technology is simplified, and it is especially suitable for the research and trial production of new devices. However, this method is limited in principle by the diffraction limit, and the resolution is difficult to break through sub-hundred nanometers. To realize direct writing with nanometer precision, it is necessary to break through the optical diffraction limit, so it is necessary to develop optical direct writing technology based on super-resolution laser technology. [0003] On the princip...

AI Technical Summary

Problems solved by technology

[0004] At present, the development of this technology is only a resolution of tens of nanometers, and its speed is very slow. It is a low-throughput direct writing technology.

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