Yellow cover plate glass for photovoltaic building integration and preparation method thereof
A technology for photovoltaic buildings and cover glass, applied in the direction of coating, etc., can solve problems such as less obvious effect, lower conversion efficiency, and unsatisfactory color change effect.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0044] A yellow cover glass for photovoltaic building integration, which is composed of a glass substrate and a multilayer film interference color layer arranged from bottom to top; the glass substrate is ultra-clear glass with a thickness of 3.2 mm, and the multilayer film interference color layer is in order : glass / AZO74nm / SiAlO x 180nm / ZrO 2 15nm.
[0045] The preparation method is:
[0046] (1) Clean the glass substrate with ultrapure water, and set the line speed to 2.0m / min;
[0047] (2) After the glass substrate is pre-vacuumized, it is transferred into the coating chamber, and the background vacuum of the coating chamber is - 5 mbar, the magnetron sputtering coating equipment is installed with a Zn target doped with 2% Al by mass, the purity of argon gas is greater than 99.99%, the flow rate is 400 sccm, the purity of oxygen is greater than 99.99%, the flow rate is 1000 sccm, and the working pressure is 2-5× 10 -3 mbar, the total power of the target is set to 180...
Embodiment 2
[0052] A yellow cover glass for photovoltaic building integration, which is composed of a glass substrate and a multilayer film interference color layer arranged from bottom to top; the glass substrate is ultra-clear glass with a thickness of 3.2 mm, and the multilayer film interference color layer is in order : glass / SiAlN x (100nm) / SiAlO x (35nm) / SiAlN x (90nm) / SiAlO x (50nm).
[0053] The preparation method is:
[0054] (1) Clean the glass substrate with ultrapure water, and set the line speed to 2.0m / min;
[0055] (2) The glass substrate is transferred into the coating chamber after pre-vacuum transition. The magnetron sputtering coating equipment is equipped with a SiAl target, the Si / Al mass ratio is 9:1, and the purity of argon gas is greater than 99.99%, and the flow rate is 400 sccm. The purity of nitrogen is greater than 99.99%, the flow rate is 800sccm, and the working pressure is 2~5×10 -3 mbar, set the total power of the target to 240KW, and use the method o...
Embodiment 3
[0061] A yellow cover glass for photovoltaic building integration, which is composed of a glass substrate and a multilayer film interference color layer arranged from bottom to top; the glass substrate is ultra-clear embossed glass with a thickness of 6mm, and the multilayer film interference color layer is sequential For: glass / ZnSnO 2 (147nm) / SiO2 2 (20nm) / ZnSnO 2 (182nm).
[0062] The preparation method is:
[0063] (1) Clean the glass substrate with ultrapure water, and set the line speed to 1.0m / min;
[0064] (2) Transfer the glass substrate into the coating chamber after pre-vacuum transition, the background vacuum of the coating chamber is - 5 mbar, the magnetron sputtering coating equipment is equipped with ZnSn target, Zn / Sn is 1:1, the purity of argon gas is more than 99.99%, the flow rate is 400sccm, the purity of oxygen is more than 99.99%, the flow rate is 800sccm, and the working pressure is 2~5×10 -3 mbar, set the total power of the target to 150KW, and use...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com