Device and method capable of carbonizing plurality of tantalum sheets simultaneously
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 哈尔滨科友半导体产业装备与技术研究院有限公司
- Publication Date
- 2021-01-01
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of semiconductor material preparation, and in particular relates to a device and a method for a tantalum carbide sheet. Background technique
[0002] AlN single crystal has the largest forbidden band width, the highest breakdown field strength, high thermal conductivity, good thermal and chemical stability among all direct bandgap semiconductor materials, and has broad application prospects in the fields of microelectronics and optoelectronics. It has become a research hotspot at home and abroad and has attracted much attention. At present, the most commonly used methods for preparing AlN single crystal substrates are HVPE (halide vapor phase epitaxy) and PVT (physical vapor transport). For AlN HVPE growth equipment, due to the strong corrosiveness of aluminum halides (AlCl, AlCl3, etc.) and the high operating temperature (usually greater than 1400 ° C), the construction of HVPE equipment is difficult, cost...