Power semiconductor device and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 湖南国芯半导体科技有限公司
- Publication Date
- 2021-01-26
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Abstract
Description
technical field
[0001] The present disclosure relates to the technical field of semiconductor devices, in particular to a power semiconductor device and a manufacturing method thereof. Background technique
[0002] Power semiconductor devices, such as metal-oxide-semiconductor field-effect transistors (Metal-Oxide-Semiconductor Field-Effect Transistor, MOSFET), in switching applications, inductive loads and parasitic inductance are not clamped intentionally or unintentionally, and the power device is turned on When it is turned off instantly, the energy stored in the inductance when the loop is turned on must be released by the power device at the moment of turn off. Due to the sudden change of the MOSFET drain current, the inductance generates a large induced electromotive force and superimposes on the power supply voltage, prompting The power device is subjected to a large voltage, is in an avalanche state and flows a large current, resulting in a large power loss. Once th...