Movable knife edge device, photoetching equipment and photoetching method

Abstract

The invention discloses a movable knife edge device, photoetching equipment and a photoetching method, and belongs to the technical field of photoetching equipment. According to the movable knife edgedevice, by arranging an X-direction vibration eliminating unit and a Y-direction vibration eliminating unit, oscillation impact generated on a supporting unit when an X-direction opening size adjusting unit and a Y-direction opening size adjusting unit move can be reduced, so that disturbance generated on a mechanical system bearing the device is reduced, the stability and reliability of the device in the working process are improved, and the machining precision and the product performance are improved. Meanwhile, by arranging an air flotation assembly, the resistance during movement of eachshaft can be reduced, so that the high-speed movement of the device is realized, and the yield of photoetching equipment is improved. Moreover, the X1 module and the X2 module perform common-rail movement, and the Y1 module and the Y2 module perform common-rail movement, so that the integrated assembling and adjusting process and device structure are simplified, the integrated assembling efficiency and device reliability are improved, and meanwhile, the cost is reduced.

Description

technical field [0001] The invention relates to the technical field of photolithography equipment, in particular to a movable knife edge device, photolithography equipment and a photolithography method. Background technique [0002] The production of large-scale integrated circuits is the core of modern microelectronics technology, and semiconductor equipment is the basis for the development of integrated circuits. In the current semiconductor manufacturing equipment, lithography equipment occupies the most important position. After the lithography technology has experienced several development stages of proximity / contact, scanning projection, and step projection, step and scan projection has developed into the current mainstream technology. [0003] The most important part of a step-and-scan projection lithography machine is the exposure system, which will generate the exposure field of view. In the photolithography process, the laser beam of the exposure system passes th...

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Problems solved by technology

[0004] The prior art discloses a multi-blade coplanar variable slit device. Four blades connected end to end and nested in each other are used to form a variable slit. The main problem is that the blades are connected mechanically. When the blade moves, it must drag another blade. When the speed increases, the load becomes larger, causing vibration effects on the frame of the lithography machine, which is not conducive to precision control, and there is no decoupling between the blades, and the application wears intensified under high-speed motion conditions. , the service life is greatly reduced

Since the two layers of cutting edges are not coplanar, in order to ensure the minimum distance between the two layers of cutting edges, the parallelism between each group of cutting edges and the perpendicularity between the cutting edges and the base plate, the machining and assembly accuracy of the four independent axes must be very high. High, the device structure is relatively complex

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