Device and method for removing particles from mask surface

Abstract

The invention relates to the technical field of reticle auxiliary devices, and discloses a device and method for removing particles from the film surface of a reticle. The cleaning device includes a support. Two columns are vertically arranged on one side of the support. The two columns are side by side and parallel. The two columns are equipped with oblique arms that can slide along the columns. The cantilevered ends of the two oblique arms face away from the direction While extending, it extends away from the support. There is a horizontal bar that can extend the sliding arm between the opposite sides of the two oblique arms. A functional module that can perform detection and clear operations is installed on the horizontal bar. The functional module can be extended horizontally. The rod slides. With the cleaning device and cleaning method, the film surface will not be scratched or particle residue will be left when inspecting and removing the particles on the film surface. Through lens scanning recognition, spray gun attitude control, and pressure adaptation, safe, fast and accurate cleaning operations can be realized. , which not only avoids the secondary pollution of the film surface, but also improves the product exposure yield.

Description

technical field [0001] The invention relates to the technical field of reticle auxiliary devices, in particular to a device and method for removing particles from a reticle film surface. Background technique [0002] The mask plate is also called photomask plate and photomask (Photo mask). The quartz glass is used as the substrate substrate. First, a layer of metal chromium is plated on the quartz glass substrate, and then photoresist (also known as photoresist) is coated on the chromium layer. Resist, a photosensitive material, its chemical properties will change under the irradiation of light of a specific wavelength), the designed circuit pattern is exposed to the photoresist through the electronic laser equipment, and the exposed area is developed by photoresist, chrome layer post-etch formation and design Figure 1 The same circuit pattern, thus becoming a photomask master similar to the exposed negative. In recent years, with the upgrading of industries such as flat p...

AI Technical Summary

Problems solved by technology

Among them, the green light is heavy and is not suitable for long-term work, and the mask film has a large layout, and the wiring of the green light is long, which increases the risk of scratching the mask film surface; when using a spray gun to remove particles on the film surface , due to the reaction force of air pressure, it is easy to cause the nozzle to vibrate, which not only increases the risk of scratching the mask surface, but also increases the possibility of man-made particles falling off the film surface

Due to the complex operating environment and high requirements for operator proficiency, the risk of artificial damage to the photoresist film surface of the mask is greatly increased

Once the photoresist film surface is scratched or scratched, it needs to be recoated; if the chrome layer or the glass substrate is scratched, the entire substrate will be completely scrapped, with huge risks and costs

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