Recovery treatment method and recovery treatment device for glass etching waste liquid

A technology for etching waste liquid and recycling treatment, applied in nitrogen fertilizer, hydrogen fluoride, fluorine/hydrogen fluoride and other directions, can solve the problems of environmental pollution and waste of glass etching waste liquid, and achieve the effect of solving environmental pollution and waste problems and reducing the three wastes.
CN112456443APending Publication Date: 2021-03-09BENGBU COLLEGE +1

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BENGBU COLLEGE
Publication Date
2021-03-09

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Abstract

The invention discloses a recovery treatment method and recovery treatment device for glass etching waste liquid. Hydrofluoric acid in the glass etching waste liquid is recovered by adopting a defluorination reaction kettle and a falling film absorption system; residual waste liquid is neutralized and crystallized to prepare nitrogen-containing salt which can be sold as a by-product of a compositenitrogen fertilizer. With the recovery treatment method and recovery treatment device for glass etching waste liquid adopted, the problems of environmental pollution and waste of the glass etching waste liquid can be solved, the purpose of clean production can be achieved for enterprises; the generation of three wastes can be reduced; the effect of circular economy can be realized; and energy-saving and environment-friendly production support can be created for enterprises.
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Description

technical field

[0001] The invention relates to the technical field of recycling industrial waste liquid, in particular to a method and device for recycling waste liquid from glass etching. Background technique

[0002] Due to the refined extension of the glass industry, there are various glass handicrafts in life, and glass needs to be further processed. The methods of glass thinning and surface treatment mainly include physical toughening, chemical toughening and acid treatment enhancement. The more commonly used surface treatment method is acid treatment. At present, etching and thinning treatment with hydrofluoric acid as the main component is commonly used. The content of HF in the glass etching thinning solution decreases continuously during use, and the H 2 SiF 6 Gradually accumulate, when reaching a certain concentration (H 2 SiF 6 content of 10-15%), the viscosity of the system increases significantly, and the etching rate changes greatly, which makes it have a...

Claims

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