MEMS microphone, micro-electromechanical structure and manufacturing method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- MEMSENSING MICROSYST SUZHOU CHINA
- Publication Date
- 2021-03-12
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Abstract
Description
technical field
[0001] The present application relates to the field of semiconductor device manufacturing, and more specifically, to MEMS microphones, micro-electromechanical structures and manufacturing methods thereof. Background technique
[0002] Devices manufactured based on Micro Electro Mechanical Systems (MEMS) are called MEMS devices. MEMS devices mainly include a vibrating membrane and a back plate, and there is a gap between the vibrating membrane and the back plate. The change of air pressure will cause the deformation of the vibrating membrane, and the capacitance value between the vibrating membrane and the electrode plate will change, which will be converted into an electrical signal output.
[0003] In the traditional MEMS microphone structure, it is mainly composed of two parallel plate capacitor structures, the back plate and the vibrating membrane. When the chip size is determined, the performance improvement is limited. Output signal, but this will intro...