Immersion liquid supply device

A supply device and liquid immersion technology, which is applied in the exposure device, optics, and instruments of the photoplate making process, can solve the problems of not taking away and removing pollutants in time, interfering with the exposure light path, etc., achieving stable optical properties, ensuring exposure quality, and enhancing exposure. The effect of the uniform effect

Pending Publication Date: 2021-04-09
ZHEJIANG CHEER TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The turbulence and vortex of the immersion liquid flow in the first gap 11 will cause the immersion liquid to not be able to remove the pollutants generated during the exposure process in time, and interfere with the exposure optical path

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Immersion liquid supply device
  • Immersion liquid supply device
  • Immersion liquid supply device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Such as figure 1 , figure 2 and image 3 As shown, an immersion liquid supply device 3 includes a surrounding surface 32 surrounding the terminal objective lens; the surrounding surface 32 has a main liquid injection port 4 through which immersion liquid is supplied to the immersion flow field. Since the substrate mainly performs a scanning motion in the X direction and a stepping motion in the Y direction relative to the immersion liquid supply device 3, during the scanning motion of the substrate, the exposure laser beam projects an integrated circuit pattern to the substrate; in order to improve It is expected that the rate of scanning motion is high; the substrate moving at a high scanning motion rate will have a strong pulling effect on the immersion liquid, which will disturb the flow direction of the immersion liquid in the immersion flow field. On the side of the surrounding surface 32 opposite to the main liquid injection port 4, the main suction outlet 5 is...

Embodiment 2

[0034] Such as Figure 4 As shown, the bottom surface 421 of the drainage flow path has an inclined section, and the end of the inclined section away from the main liquid inlet interface 41 is farther from the bottom surface 431 of the outlet flow path. The remaining implementation modes are the same as the first embodiment.

[0035] Due to the inertia of the immersion liquid flowing in the drainage channel 42, the end away from the main liquid inlet port 41 (the end in the -X direction) will be blocked by the wall and accumulate the immersion liquid, which will increase the local pressure and cause the main liquid injection port 4 There is a larger immersion liquid flow rate on the -X side; the bottom surface 421 of the drainage flow path is set to have a larger volume at the -X end, which can accommodate more accumulation of immersion liquid, thereby alleviating the inflow and outflow flow caused by the flow inertia of the immersion liquid The problem of uneven traffic afte...

Embodiment 3

[0037] Such as Figure 5 As shown, the immersion liquid supply device 3 also includes a second orifice plate 82, the second orifice plate 82 is arranged at the junction of the drainage flow path 42 and the outflow flow path 43, and the second orifice plate 82 is parallel to the bottom surface 431 of the outflow flow path Set, there are evenly distributed through small holes on the second orifice plate 82 . The remaining implementation modes are the same as the first embodiment.

[0038] The second orifice 82 relatively isolates the drainage channel 42 from the outlet channel 43. On the one hand, it can enhance the flow uniformity of the immersion liquid flowing from the drainage channel 42 into the outlet channel 43. On the other hand, it can also play a role in isolation and drainage. The effect of the pressure pulsation of the flow path 42 and the outflow flow path 43 cuts off the mutual influence path of the pressure pulsation from the immersion flow field and the immersio...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an immersion liquid supply device. The device comprises a surrounding surface surrounding a tail end objective lens. A main liquid injection opening is formed in the surrounding surface, and an immersion liquid is provided for an immersion flow field through a main liquid inlet connector, a main liquid supply flow path and the main liquid injection opening in sequence; the main liquid supply flow path comprises a drainage flow path and an outflow flow path which are sequentially connected, the drainage flow path is connected with the main liquid inlet connector, and the outflow flow path is connected with the main liquid injection opening; and the drainage flow path is positioned below the outflow flow path. According to the invention, the immersion liquid is provided for the immersion flow field through the main liquid injection opening, the immersion liquid is provided for the main liquid injection opening through the main liquid supply flow path, and the main liquid supply flow path comprises the drainage flow path and the outflow flow path so that the immersion liquid has more uniform flow distribution in the width direction of the outflow flow path; a pore plate is arranged in the main liquid supply flow path in a matched manner to enhance an uniform effect of flow; and stable flowing of the immersion flow field is facilitated, turbulent flow and vortexes are prevented from being formed in the immersion flow field, stable optical properties of the immersion flow field are guaranteed, and the exposure quality is ensured.

Description

technical field [0001] The invention belongs to the technical field of immersion photolithography machines, and relates to an immersion liquid supply device. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. It uses the optical system to accurately project the circuit pattern on the mask onto the photoresist-coated substrate and modify the photoresist exposure to modify the photoresist. Circuit pattern information is left on the substrate. It includes a laser light source, a projection objective lens system, a projection mask containing circuit patterns and a substrate coated with photosensitive photoresist. [0003] Compared with the dry lithography machine in which the intermediate medium is gas, the immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index (called immersion liquid or immersion liquid) between the last projection objective lens and the substrate. , by incre...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2041G03F7/70341
Inventor 李元吴敏池优阳陈文昱付婧媛
Owner ZHEJIANG CHEER TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap