Microwave power source, microwave plasma system, ignition method and self-tuning method
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 苏州迈微能等离子科技有限公司
- Publication Date
- 2021-04-13
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Abstract
Description
[0001] Cross References to Related Applications
[0002] This application claims priority to the Chinese Patent Application No. 2020101914439 filed with the China Patent Office on March 18, 2020, the entire contents of which are incorporated herein by reference. technical field
[0003] The invention relates to the technical field of plasma physics, in particular to a microwave power source, a microwave plasma system, an ignition method and a self-tuning method. Background technique
[0004] Microwave plasma refers to the use of electromagnetic wave transmission energy to excite gas to generate ionization to form plasma. Compared with other methods to stimulate plasma, microwave plasma has the following advantages: 1. Higher degree of ionization and decomposition, 2. Higher electron temperature, thus Reach a lower plasma temperature, 3. There is no electrode, and there will be no pollution caused by electrode loss. 4. The working pressure range is wide and can be applied to...