Mask, evaporation device and evaporation method
A technology of reticle and mask, which is applied in the field of reticle, can solve the problems that the mask cannot be fully stretched, affects the yield rate, and poor color mixing, so as to avoid poor color mixing and improve the yield rate
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Embodiment 2
[0061] The reticle structure in this embodiment includes the shielding strips similar to those in Embodiment 1, and also has a convex portion 21 and side wings 22 connected to both sides of the convex portion 21, which is roughly the same as the corresponding structure in Embodiment 1. , for the same structure, refer to the corresponding description in Embodiment 1, which will not be repeated here. Wherein the main difference between the two is that the convex portion 21 is hemispherical, please refer to Figure 7 , Figure 7 A schematic cross-sectional structure diagram of the reticle 100 provided by the embodiment of the present invention.
[0062] The beneficial effect of the present invention is that: the present invention provides a mask plate, an evaporation device and an evaporation method. A convex portion 21 is provided at the middle position of the shielding strip 20. When the mask plate 100 is bonded to the glass substrate 200, the glass substrate 200 is pressed T...
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