Substrate preparation method and substrate structure, chip packaging method and chip packaging structure
A substrate preparation and substrate technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, semiconductor devices, etc., can solve the problem that the depth of openings is not easy to control, the conductive circuit of the chip is easy to be damaged, and the yield rate of the chip packaging structure is affected To achieve the effect of improving the stability of interface bonding, improving the efficiency of opening holes, and reducing warpage
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Embodiment 1
[0104] The chip packaging method of this embodiment includes the following steps:
[0105] S10, prepare the first sub-substrate:
[0106] S10a, providing a first glass substrate 11, pasting a first photosensitive dry film on one side of the first glass substrate 11, and forming several windows after exposure and development;
[0107] S10b, performing laser focusing modification on the first glass substrate 11 exposed to the window, and then using a hydrofluoric acid solution to etch the laser focusing modified region to obtain a TGV through hole 12 penetrating the first glass substrate 11, refer to figure 1 ;
[0108] S10c, forming the first conductive pillars 13 in the TGV through holes 12 by electroplating, and making the two end faces of the first conductive pillars 13 flush with the two sides of the first glass substrate 11 respectively, and then removing the remaining first photosensitive dry film ,refer to figure 2 ;
[0109] S20, prepare the second sub-substrate:
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Embodiment 2
[0139] The chip packaging method of this embodiment is basically the same as the above-mentioned first embodiment, and the difference lies in the substrate preparation method. The substrate preparation method specifically includes the following steps:
[0140] S10, prepare the first sub-substrate:
[0141] S10a, providing a first glass substrate 11, pasting a first photosensitive dry film on one side of the first glass substrate 11, and forming several windows after exposure and development;
[0142] S10b, performing laser focusing modification on the first glass substrate 11 exposed to the window, and then etching the laser focusing modified region with an ammonium hydrogen fluoride solution to obtain a TGV through hole 12 penetrating the first glass substrate 11, refer to figure 1 ;
[0143] S10c, forming a first conductive column 13 in the TGV through hole 12 by electroplating, and making one end surface of the first conductive column 13 flush with one side of the first gl...
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