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Color film layer

A color film layer, coating technology, applied in the direction of coating, superimposed layer coating, metal material coating process, etc.

Pending Publication Date: 2021-05-25
NANOFILM VACUUM COATING SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in general, it is not acceptable if the film layer on the substrate requires a specific color, such as a consumer device, and this color can only be perceived from a specific angle

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0093] The invention is illustrated by the following examples:

[0094] A sputtering device with a silicon target as the source body is used to coat the thin substrate under the action of nitrogen and oxygen reaction gases.

[0095] Thin substrates are rinsed in deionized water outside the chamber, then introduced into the chamber and evacuated to operating pressure. The thin substrate is then ion cleaned. Then coat the following film material and film thickness on the clean thin substrate surface. The wafer substrates in the chamber are polished stainless steel sheets, and the final step is to apply the AFP coating before leaving the chamber. Use conventional equipment to test the coating color, its parameters L, a and b, the results are shown in Table 1.

[0096] Table 1

[0097]

[0098] The film thickness refers to the required thickness input into the sputtering device by the program. In practice, there may be a tolerance of plus or minus 1-2nm in the actual thic...

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Abstract

The invention discloses a substrate plated with a color film layer, a manufacturing method of the substrate and a product comprising or containing the substrate plated with the color film layer. The substrate comprises a base material applied to the plating layer, and the plating layer comprises basically parallel layers, namely a first interference layer adjacent to the base material, a second interference layer adjacent to the base material, and a third interference layer adjacent to the base material, a second interference layer; and a first refractive layer; wherein the first interference layer and the second interference layer are provided with partial reflection surfaces and have the thickness matched with the wavelength of visible light, so that reflected light on the respective surfaces interfere with each other to generate colors; wherein the first refraction layer can reduce the angle between incident light and the reflection surface, so as to weaken the dependence of interference color on the angle.

Description

technical field [0001] The invention relates to a color film layer on a base material, a method for preparing the film layer, a base material for the film layer application and a product obtained by the method. Background technique [0002] A variety of deposition techniques are used to coat substrates. Vapor deposition techniques are commonly used to form thin film deposits in a variety of applications, including microelectronics applications and durable product applications. Such deposition techniques can be divided into two broad categories. The first class of such deposition techniques is known as chemical vapor deposition (CVD). CVD refers to a deposition process that occurs due to a chemical reaction. Common examples of CVD processes include semiconductor Si layer deposition, epitaxy, and thermal oxidation. [0003] The second type of deposition is commonly referred to as physical vapor deposition (PVD). PVD refers to the physical process of deposition of solid ma...

Claims

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Application Information

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IPC IPC(8): G02B5/28
CPCG02B5/286C23C14/34C23C14/0015C23C14/0036C23C14/10C23C14/165C23C14/0652C23C28/345C23C28/30C23C28/32C23C28/34
Inventor 唐智
Owner NANOFILM VACUUM COATING SHANGHAI