Exhaust-gas plasma detoxification method, and device for same
A plasma and waste gas technology, applied in the directions of plasma, separation method, gas treatment, etc., can solve the problems of not easy to decompose, difficult to remove PFC, and unable to place the greenhouse effect on the earth's environment, so as to achieve the improvement of the removal efficiency. Effect
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[0037] Hereinafter, the present invention will be described based on illustrated embodiments. figure 1 It is the exhaust gas treatment device X of the present invention. These are devices used in the semiconductor manufacturing process. For example, exhaust gas H exhausted from CVD film formation equipment S is sucked by vacuum pump V, transported to exhaust gas treatment equipment X, decomposed by thermal decomposition, and discharged to the atmosphere.
[0038] In addition, in the description of the background art, the detoxification of PFC exhaust gas was taken as a representative example for description, but since the refractory exhaust gas is not limited to PFC exhaust gas, the gas to be treated in the present invention is simply referred to as exhaust gas H.
[0039] figure 1In one example, the exhaust gas treatment device X is composed of an independent water treatment device A and a thermal decomposition device B provided with an outlet scrubber 60 . Although not sho...
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