Wear-resistant impurity-eliminating optical glass element as well as preparation method and application thereof
An optical glass, impurity-removing technology, used in optical components, optics, instruments, etc., can solve the problems of optical glass scratches, limiting the wide application of optical glass, and low wear resistance of optical glass.
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[0041] The second aspect of the invention provides a method of preparing the above wear-resistant hybrid optical glass element, and the specific steps include:
[0042] (1) Formulate glass mixture, prepare optical glass substrates;
[0043] (2) The doped metal ion is introduced into the glass mixture to form a mixed A, cast in the surface of the optical glass substrate, under reduced gas atmosphere, forming a base layer;
[0044] (3) Introduction of the doped metal ion into the glass fitting forming blend B, casting on the base layer surface, under reduced gas atmosphere, forming a transition layer;
[0045] (4) The doped metal ion is introduced into the glass mixture to form a mixing C, cast in the surface of the transition layer, and the reduction treatment is performed under reduced gas atmosphere, forming a functional layer;
[0046] (5) After the surface obtained in step (4), an optical glass having a base layer, a transition layer, and a function layer is sequentially proces...
Embodiment 1
[0056] (1) The glass mixture was prepared according to Table 1, and the borosilicate K9 optical glass substrate was prepared.
[0057] (2) 0.05mol% TIO 2 And 3 mol% SNO 2 The introduction into the glass mixture forming a mixed A, casting in the surface of the optical glass substrate, in H 2 In a temperature of 500 ° C, 10 h, the pressure of the reduction treatment is 5 MPa, forming the base layer, the thickness of the base layer is 0.8 mm;
[0058] (3) 1 mol% of TiO 2 And 3 mol% SNO 2 The introduction into the glass mixture forms a mixed B, casting on the base layer surface, in H 2 The pressure of 20 h in a temperature of 600 ° C, the pressure of the reduction treatment was 5 MPa, forming a transition layer, and the transition layer had a thickness of 0.5 mm;
[0059] (4) 10 mol% of TIO 2 And 3 mol% SNO 2 The introduction into the glass mixture forms a mixed C, cast it on the surface of the transition layer, in H 2 In the temperature of 700 ° C for 30 h, the pressure of the reduct...
Embodiment 2
[0064] (1) The glass mixture was prepared according to Table 1, and the borosilicate K9 optical glass substrate was prepared.
[0065] (2) TIO 0.1 mol% TIO 2 And 5mol% GA 2 O 3 The introduction into the glass mixture forming a mixed A, casting in the surface of the optical glass substrate, in H 2 The pressure of 10 h in a temperature of 550 ° C, the pressure of the reduction treatment is 10 MPa, forming the base layer, the thickness of the base layer is 0.9 mm;
[0066] (3) 5mol% TIO 2 And 5mol% GA 2 O 3 The introduction into the glass mixture forms a mixed B, casting on the base layer surface, in H 2 In a temperature of 650 ° C, 25 h, the pressure of the reduction treatment is 10 MPa, forming a transition layer, and the thickness of the transition layer is 0.5 mm;
[0067] (4) 15mol% TiO 2 And 5mol% GA 2 O 3 The introduction into the glass mixture forms a mixed C, cast it on the surface of the transition layer, in H 2 The temperature reduction of 800 ° C was reduced by 40 h, and ...
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