Photoelectric amplification integrated triode chip
A photoelectric amplification and photodiode technology, applied in electrical components, electronic switches, pulse technology, etc., can solve the problems of magnification that changes with ambient temperature, inability to take into account signal-to-noise ratio and bandwidth, and difficulty in processing circuits, and achieves transmission response speed. Fast, miniaturized, and high signal-to-noise ratio
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Embodiment 1
[0039] refer to figure 2 and image 3 , this embodiment provides a photoelectric amplification integrated triode chip, including:
[0040] The photodiode unit 12, the photodiode unit 12 includes a photodiode, and the photodiode is a PIN structure. Wherein the N-type layer is N-InP, the I layer is I-InGaAsP, and the P-type layer is P-InP.
[0041] In some other embodiments, the photodiode may also be a PN structure, or a photodiode with other structures.
[0042] The proportional current mirror unit 11. The proportional current mirror unit 11 uses the P-type layer of the photodiode unit 12 as a substrate and is electrically connected to the P-type layer of the photodiode. In some other embodiments, the proportional current mirror unit 11 may use the N-type layer of the photodiode unit 12 as a substrate and be electrically connected to the N-type layer of the photodiode.
[0043] The photoelectric amplification integrated triode chip of this embodiment realizes the amplific...
Embodiment 2
[0065] This embodiment provides a photoelectric amplifier integrated triode chip, which differs from the above-mentioned embodiment 1 in that:
[0066] The proportional current mirror unit includes a plurality of triodes, and the plurality of triodes include a receiving triode and a plurality of amplifying transistors;
[0067] The collector and the base of the receiving triode are electrically connected; the N-type layer or the P-type layer where the photodiode is electrically connected to the receiving triode is provided with a first heavily doped region and a plurality of second heavily doped regions, and the first heavily doped The conductivity type of the region is the same as that of the layer, the conductivity type of the plurality of second heavily doped regions is opposite to the conductivity type of the layer, and the plurality of second heavily doped regions are respectively located at positions corresponding to the collector and emitter of each triode; The first he...
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