Ultrapure water filtering system

Abstract

The invention discloses an ultrapure water filtering system which comprises a filtering system body, the filtering system body mainly comprises a filtering tank and a disinfection tank, the filtering tank mainly comprises a tank body and a plurality of filtering layers transversely arranged in the tank body, a water inlet is formed in the top of the filtering tank, the bottom of the filtering tank is provided with a water outlet with an electromagnetic valve, and the water outlet is connected with the disinfection tank through a water outlet pipeline with a water suction pump and a one-way valve and conveys filtered water to the disinfection tank for disinfection; the disinfection tank comprises a first disinfection tank and a second disinfection tank, a water quality detection system is arranged in the first disinfection tank, and a first control valve and a second control valve are arranged on a water outlet of the first disinfection tank through a three-way pipeline; the water quality detection system is used for detecting the quality of the disinfected water in the first disinfection tank and controlling the on-off of the first control valve and the second control valve according to a detection result so as to discharge the water in the first disinfection tank or circulate the water to the second disinfection tank for secondary disinfection.

Description

technical field [0001] The invention relates to the technical field of water treatment devices, in particular to an ultrapure water filtration system. Background technique [0002] Ultrapure water, also known as UP water, has a resistivity of 18MΩ*cm. It is often used in the integrated circuit industry for cleaning semiconductor raw materials and utensils, preparation of photolithography masks, and water vapor sources for silicon wafer oxidation. In addition, other solid-state electronic devices, thick-film and thin-film circuits, printed circuits, vacuum tubes, etc. must also use ultra-pure water. Ultra-pure water treatment is a level that is difficult to achieve with general processes. Four major steps of ultra-purification treatment and post-treatment, multi-stage filtration, high-performance ion exchange unit, ultrafiltration filter, ultraviolet lamp, TOC removal device and other treatment methods, the resistivity can reach 18.25MΩ*cm, super Filtration equipment is ofte...

AI Technical Summary

Problems solved by technology

[0002] Ultrapure water, also known as UP water, has a resistivity of 18MΩ*cm. It is often used in the integrated circuit industry for cleaning semiconductor raw materials and utensils, preparation of photolithography masks, and water vapor sources for silicon wafer oxidation. In addition, other solid-state electronic devices, thick-film and thin-film circuits, printed circuits, vacuum tubes, etc. must also use ultra-pure water. Ultra-pure water treatment is a level that is difficult to achieve with general processes. Four major steps of ultra-purification treatment and post-treatment, multi-stage filtration, high-performance ion exchange unit, ultrafiltration filter, ultraviolet lamp, TOC removal device and other treatment methods, the resistivity can reach 18.25MΩ*cm, super Filtration equipment is often needed in the production of pure water, but the existing ultrapure water filtration equipment has a relatively simple structure, and most of them have an integrated filtration structure, which is inconvenient to clean and has the problem of poor filtration effect, which increases the follow-up The processing pressure of the equipment increases the processing cost

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