In-situ growth preparation method of porous TiO2 nanocellulose network composite membrane
A nanocellulose and network composite technology, which is applied in the field of in-situ growth and preparation of porous TiO2 nanocellulose network composite membranes, can solve the problems of material preparation and application obstacles, the inability of catalytic materials to be closely combined with flexible substrate materials, etc. performance, promoting effects in the field of flexible wearable devices
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Embodiment 1
[0020] Example 1: A porous TiO 2 The in-situ growth preparation method of the nanochemical composite film, including the following steps:
[0021] S1, the purity is 99.99% TiO 2 The target is placed in a muffle furnace, the muffle furnace is heated to 450 ° C, holding 2h and cools with the furnace to prevent the target cracking;
[0022] S2, a nanochemical suspension of 100 ml of concentration of 0.1% was vacuum filtered, dried to obtain a nanocolyte membrane, and placed in a magnetron sputtering device, in step 1 in the annealing TiO 2 For the target, pure argon gas is introduced into the vacuum chamber, the sputtering power is 300 W, the sputtering time is 2 h, resulting in a raw material for the preparation of nanoporous materials;
[0023] After S3, step S2, the target of the magnetron sputtering device is replaced with a metal titanium target having a purity of 99.99%, and the material in step 2 is continued, and pure argon is introduced into the vacuum chamber. The power is ...
Embodiment 2
[0026] Example 2: A porous Tio 2 The in-situ growth preparation method of the nanochemical composite film, including the following steps:
[0027] S1, the purity is 99.99% TiO 2 The target is placed in a muffle furnace, the muffle furnace is heated to 450 ° C, holding 2h and cools with the furnace to prevent the target cracking;
[0028] S2, a nanochemical suspension of 100 ml of concentration of 0.1% was vacuum filtered, dried to obtain a nanocolyte membrane, and placed in a magnetron sputtering device, in step 1 in the annealing TiO 2 For the target, pure argon gas is introduced into the vacuum chamber, the sputtering power is 300W, and the sputtering time is 1 h;
[0029] After S3, step S2, the target of the magnetron sputtering device is replaced with a metal titanium target having a purity of 99.99%, and the material in step 2 is continued, and pure argon is introduced into the vacuum chamber. The power is 100W, the control sputtering time is 450s to obtain a composite film s...
Embodiment 3
[0032] Example 3: A porous TiO 2 The in-situ growth preparation method of the nanochemical composite film, including the following steps:
[0033] S1, the purity is 99.99% TiO 2 The target is placed in the muffle furnace, the muffle furnace is heated to 500 ° C, holding 3 hours and cools with the furnace to prevent the target cracking;
[0034] S2, a nanochemical suspension of 200 ml of concentration of 0.1% was vacuum filtered, dried to give a nanochemical membrane, and placed in a magnetron sputtering device, in step 1 in an annealing TiO 2 For the target, pure argon gas is introduced into the vacuum chamber, the sputtering power is 200W, and the sputtering time is 1 h;
[0035] After S3, step S2, the target of the magnetron sputtering device is replaced with a metal titanium target having a purity of 99.99%, and the material in step 2 is continued, and pure argon is introduced into the vacuum chamber. The power is 100W, the control sputtering time is 350s to obtain a composite ...
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