Double-path parallel super-resolution laser direct writing device based on light field regulation and control

Abstract

The invention discloses a double-path parallel super-resolution laser printing device based on light field regulation and control, and belongs to the field of super-resolution laser micro-nano machining. Laser emitted by a direct-writing laser sequentially passes through a direct-writing path collimator, a direct-writing path anti-drifting system, a direct-writing path energy regulation and control module and a direct-writing path wavefront regulation and control module to enter a beam combining module; laser emitted by the suppression path laser sequentially passes through the suppression path collimator, the suppression path anti-drifting system, the suppression path energy regulation and control module and the suppression path wavefront regulation and control module to enter the beam combining module; the direct writing light is modulated in the direct writing path wavefront regulation and control module, the suppression light is modulated in the suppression path wavefront regulation and control module, and two pairs of direct writing-suppression light spot combinations are formed after the two paths of light are combined. According to the invention, through partition multiplexing of the SLM and utilization of the polarization selection characteristic of the SLM, double focusing light spots are realized on the basis of a direct writing light beam and a suppression light beam, independent regulation and control of energy of each light spot are realized, and the speed of a laser direct writing printing system is doubled.

Description

technical field [0001] The invention belongs to the field of laser direct writing processing, and in particular relates to a two-way parallel PPI (peripheral photo inhibition, edge light suppression) super-resolution laser direct writing device based on light field regulation. Background technique [0002] Two-photon laser printing is an important technology in the field of modern micro-nano processing, which is widely used in the modern semiconductor industry, especially the processing of masks. At the same time, taking advantage of the laser's ability to focus on the interior of materials, two-photon laser printing technology also has intrinsic three-dimensional processing capabilities in space. More importantly, it does not require harsh processing for other widely used micro-nano processing technologies. The environment, such as ultra-vacuum, etc., is not limited to the mask plate, and the equipment cost is relatively low. However, although the processing resolution of ...

AI Technical Summary

Problems solved by technology

However, although the processing resolution of hundreds of nanometers can be achieved by using the nonlinear absorption effect of the material on the laser, due to the limitation of the wavelength, the resolution of the laser direct writing printing technology based on two photons is not as good as that of the electron beam direct writing technology.

In addition, although the processing speed of laser direct writing printing is better than that of electron beam exposure in terms of speed, its processing speed is still not comparable to that of projection lithography technology, which means that the current two-photon laser printing technology still cannot be applied to large-scale Processing, its three-dimensional processing ability and the advantages of not being restricted by the environment have not been fully utilized

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