A terahertz metamaterial absorber that suppresses infrared absorption
An infrared absorption and terahertz technology, applied in the field of metamaterials, achieves high robustness, suppression of infrared wave absorption, and good absorption rate
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Embodiment 1
[0044] A terahertz metamaterial absorber that suppresses infrared wave absorption, such as figure 2 and 3As shown, it includes a first metal pattern layer 1 , a dielectric layer 2 and a second metal reflection layer 3 . The first metal pattern layer 1 is located at the upper end of the dielectric layer 2 and is in contact with the dielectric layer 2 , and the second metal reflection layer 3 is located at the lower end of the dielectric layer 2 and is in contact with the dielectric layer 2 . The pattern on the first metal pattern layer 1 is formed by cutting out the thin line pattern 4 from the whole surface of the metal. The thin line pattern 4 is a circle with an outer circle radius r=8.7um, and the width of the thin line is d=0.2um. The arrangement of the thin line patterns 4 is a hexagonal arrangement, the width of the periodic unit is a=20um, and the length of the periodic unit is b=34.6um. The first metal pattern layer 1 is made of gold or copper, the second metal refle...
Embodiment 2
[0046] The only difference between Embodiment 2 and Embodiment 1 is that the material of the dielectric layer 2 is polyimide, and some of the parameters are adjusted. The adjusted parameters are that the thickness of the dielectric layer 2 is h2=1.15um. The characteristic double absorption peaks in the terahertz band of the obtained terahertz metamaterial absorber that suppress infrared wave absorption are located at 4.3THz and 11.2THz, as shown in Figure 7 shown.
Embodiment 3
[0048] A terahertz metamaterial absorber that suppresses infrared wave absorption, Figure 4 As shown, it includes a first metal pattern layer 1 , a dielectric layer 2 and a second metal reflection layer 3 . The first metal pattern layer 1 is located at the upper end of the dielectric layer 2 and is in contact with the dielectric layer 2 , and the second metal reflection layer 3 is located at the lower end of the dielectric layer 2 and is in contact with the dielectric layer 2 . The pattern on the first metal pattern layer 1 is formed by engraving the thin line pattern on the entire surface of the metal. The thin line pattern is a regular hexagon with side length L=6.7um, and the width of the thin line is d=0.2um. The first metal pattern layer 1 is made of gold or copper, the second metal reflective layer 3 is made of gold or copper, and the dielectric layer 2 is made of silicon. The thickness of the first metal pattern layer 1 is h1=0.2um, the thickness of the dielectric lay...
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