Diode chip structure and manufacturing method
A manufacturing method and diode technology, which are applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as increased loss, increased MOS tube pressure, and increased MOS tube overshoot voltage to reduce overshoot voltage. , Increase the softness, slow recovery characteristics more effect
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[0071] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0072] The invention provides a method for manufacturing a diode chip.
[0073] Step A, please refer to figure 2 , at least one epitaxial layer 02 of a first conductivity type is formed on the substrate 01 , and the first conductivity type is the same as that of the substrate 01 . In this implementation manner, the first conductivity type is N type. In this embodiment, the epitaxial layer 02 has two layers, including the first epitaxial layer 021 and the second epitaxial layer 022 from bottom to top, and the resistivity and thickness of the second epitaxial layer 022 are both Correspon...
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