Method and device for realizing Josephson junction selective epitaxial growth and medium

Abstract

The invention provides a method and device for realizing Josephson junction selective epitaxial growth and a medium. The Josephson junction is a superconducting circuit Josephson junction, and the selective epitaxial growth is achieved based on a topological insulator. The method specifically comprises the steps of S1, preprocessing a wafer to obtain a mask, wherein the mask is used for the selective epitaxial growth of the Josephson junction; S2, carrying out isotropic etching on a silicon dioxide film in the mask plate by using hydrofluoric acid so as tosuspendthe mask plate; S3, spraying the high-temperature atomized topological insulator by using an electron beam evaporator so as to realize the selective epitaxial growth ofthe topological insulator through the mask above the groove; and S4, depositing a superconductor on the topological insulator on which the selective epitaxial growth is completed, so as to obtain the Josephson junction formed by the superconductor and the topological insulator.

Description

technical field [0001] The disclosure relates to the field of quantum computing, in particular to a method, device and medium for realizing selective epitaxial growth of Josephson junctions. Background technique [0002] Quantum computing is a new computing method based on quantum mechanics. Using the unique entanglement and superposition characteristics of quantum states, when solving certain specific problems, compared with classical computers, quantum computers have an exponential acceleration effect. At the same time, due to the unmeasurable principle in quantum mechanics, in During the calculation process, the communication result is not easy to be stolen by the outside world, and it has security in principle. [0003] However, the physical realization of quantum computing has been challenging. In recent years, quantum computing based on superconducting circuits has made great progress, and has attracted many people's attention due to its good scalability and easy man...

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Problems solved by technology

[0005] The above method cannot accurately control the area of ​​the Josephson junction during the preparation process

At the same time, the above method controls the oxidation parameters of the material by adjusting the oxidation time and air pressure, resulting in inaccurate oxidation parameters of the material.

Both the area of ​​the Josephson junction and the oxidation parameters of the material will seriously affect the critical current of the Josephson junction. In other words, the critical current of the Josephson junction prepared by the above method usually has a large gap with the target current. In actual quantum computing In applications, it will seriously interfere with the accuracy of quantum computing

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