Method for carrying out selective area deposition of silver nano particles on surface of PDMS (Polydimethylsiloxane) elastic body

A technology of silver nanoparticles and elastomers, applied in the field of microstructure processing of polymers, can solve problems such as increasing the size of electrical circuits, and achieve the effects of good elasticity, easy processing, avoiding the use of instruments and tedious operation steps

Inactive Publication Date: 2013-10-23
TIANJIN UNIV
View PDF2 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But a diffusion barrier layer is required to prevent copper from diffusing into the silicon material, which can easily increase the size of the electrical circuit

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for carrying out selective area deposition of silver nano particles on surface of PDMS (Polydimethylsiloxane) elastic body
  • Method for carrying out selective area deposition of silver nano particles on surface of PDMS (Polydimethylsiloxane) elastic body
  • Method for carrying out selective area deposition of silver nano particles on surface of PDMS (Polydimethylsiloxane) elastic body

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] A method for selective deposition of silver nanoparticles on the surface of a PDMS elastomer, comprising the following steps:

[0021] 1. Mix the PDMS prepolymer and cross-linking agent at a mass ratio of 10:1, pour it into a culture vessel, and stir it fully with a glass rod to form a prepolymer;

[0022] 2. There are small air bubbles in the mixed pre-polymer, and the air is degassed by a circulating water-type multi-purpose vacuum pump for 2 hours to remove the air bubbles; Curing at high temperature for 6 hours to obtain the PDMS elastomer for subsequent use;

[0023] 3. Cut the PDMS elastomer into strips of 6cm×2cm, and undergo oxygen plasma treatment for a certain period of time in a stretched state, that is, undergo oxygen plasma treatment for 10 minutes in a pre-stretched state of 20%, and then, from After being taken out of the oxygen plasma, it retracts at a rate of 0.5% / min to obtain a wrinkle template;

[0024] 4. Immerse the wrinkle template obtained in t...

Embodiment 2

[0028] A method for selectively depositing silver nanoparticles on the surface of PDMS elastomer, embodiment 2 is the same as steps 1-5 of embodiment 1, and then the wrinkle template is re-contacted face-to-face with the substrate, before the re-contact, the wrinkle template is rotated 90 relative to the substrate degree, after the two are in contact, a load of 20g is applied in a direction perpendicular to the contact surface, and the wrinkle template is peeled off from the substrate after the wrinkle template and the substrate are in contact for 30min, and the amounts of stannous ions are obtained respectively on the surface of the wrinkle template and the substrate. Selected area pattern: immerse the treated wrinkle template and substrate in the electroless deposition solution respectively, take it out after 40 minutes of reaction, rinse with distilled water several times and then dry to form a pattern on the surface of PDMS elastomer (including wrinkle template and substrate...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for carrying out selective area deposition of silver nano particles on the surface of a PDMS (Polydimethylsiloxane) elastic body, which implements selective area deposition of the silver nano particles by using a PDMS wrinkle pattern as a template and combining an electroless deposition technology. After being processed in an oxygen plasma, pre-stretched PDMS retracts to obtain the wrinkle pattern; the pattern is used as the template for selectively transferring stannous ions on a PDMS substrate; and finally, electroless deposition of the silver nano particles is carried out to obtain a selective area pattern of the silver nano particles. The PDMS is low in price, has excellent elasticity and light transmission, has no toxicity, is easy to process and is one of micro-fluidic chip materials which are the most widely applied currently. The electroless deposition technology is one of main methods of constructing a submicron-class metal thin film on the surface of the substrate, is simple to operate and lower in cost, and has no limitation to both the shape and the size of a sample due to the liquid phase reaction. The method disclosed by the invention has the characteristics of rapidness and simplicity and application of expensive materials and complex instruments and harsh process conditions are avoided.

Description

technical field [0001] The invention relates to the microstructure processing technology of polymers, in particular to a wrinkling process method for a multi-layer film based on PDMS elastomer. Background technique [0002] In recent years, in order to reduce the size of large-scale integrated circuits (ULSL), there are very strict requirements on the quality of metals and the size of connecting lines between them. At present, copper and aluminum are mainly used for the interconnection of ULSL chips. Due to the relatively high electrical resistance of aluminum, it has been difficult to meet the requirements for increasingly narrower and denser arranged connecting lines. Although copper has better conductivity and has lower electromigration and stress migration. But a diffusion barrier layer is required to prevent copper from diffusing into the silicon material, which easily increases the size of the electrical circuit. Among metal materials, silver has a relatively high m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/768B81C1/00
Inventor 鲁从华王旭东
Owner TIANJIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products