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Wavefront sensor and associated metrology apparatus

A technology of wavefront sensor and wave measurement, which is applied in the direction of measuring device, photo-plate making process exposure device, instrument, etc., and can solve the problems such as difficult to manufacture focusing optical devices

Pending Publication Date: 2021-09-03
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] Wavefront measurements in the extreme ultraviolet (EUV) and soft x-ray (SXR) spectral regions are challenging because most materials are highly absorbing and focusing optics are difficult to fabricate

Method used

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  • Wavefront sensor and associated metrology apparatus
  • Wavefront sensor and associated metrology apparatus
  • Wavefront sensor and associated metrology apparatus

Examples

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Embodiment Construction

[0030] Before describing embodiments of the invention in detail, it is instructive to present an example environment in which embodiments of the invention may be implemented.

[0031] figure 1 A lithographic apparatus LA is shown at 100 as part of an industrial facility implementing a large-scale lithographic fabrication process. In this example, the fabrication process is adapted to fabricate semiconductor products (integrated circuits) on substrates such as semiconductor wafers. The skilled artisan will appreciate that, in variations of this process, a wide variety of products can be fabricated by processing different types of substrates. Purely take the production of semiconductor products as an example, which is of great commercial importance today.

[0032]Within a lithographic apparatus (or simply "lithographic tool" 100 ), a measurement station MEA is shown at 102 and an exposure station EXP is shown at 104 . At 106 a control unit LACU is shown. In this example, ea...

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Abstract

Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from EP application 19153671.3 filed on January 25, 2019, which is hereby incorporated by reference in its entirety. technical field [0003] The present disclosure relates to methods and apparatus that may be used for inspection (eg, metrology) in device fabrication, eg, by lithography, and to methods of manufacturing devices using lithography. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually to a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this example, a patterning device (which is alternatively referred to as a mask or reticle) may be used to generate a circuit pattern to be formed on the individual layers of the IC. This pattern can be transferred onto a target portion (eg, a portion comprising one or several chips)...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G01J9/00H05G2/00G02B3/00G02B5/18
CPCG01J9/00G01J2009/002G03F7/706G03F7/70616G02B3/0056G02B3/0075G02B3/0068G02B5/1819G02B5/1814G21K1/065H05G2/00G03F7/706847G01N23/207G02B3/0037G02B5/1838
Inventor S·T·范德波斯特P·D·范福尔斯特
Owner ASML NETHERLANDS BV
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