Etching-free metasurface doped based on space rule and compatible with traditional optical thin film
A metasurface and optical thin film technology, applied in the field of non-etching metasurface, can solve the problems of difficult technical processing, improvement of light energy utilization rate, and difficulty in preparation
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[0030] The invention is a novel superstructure surface doped based on the spatial regularity of the semiconductor thin film. The dielectric function of the doped region can be changed by doping a specific region of the semiconductor thin film material by means of plasma implantation, etc., and an array structure similar to the traditional metasurface can be designed and constructed to realize the polarization of electromagnetic waves. Efficient regulation of , propagation mode, and phase, such as figure 1 Shown in b-c. The doped region is equivalent to the microstructure of the traditional metasurface. Therefore, a new type of metasurface can be made by rationally designing the unit and arrangement of the doped region, that is, the doped metasurface (Doping metasurface). metasurface).
[0031] Through the above design scheme, the generalized Snell's Law can be applied to the doped metasurface. figure 1 d is a schematic diagram of doped metasurface changing phase, from figu...
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