Process for mfg. one-dimensional X ray refracted diffraction micro structural component of polymethyl methyl acrylate material

A technology of polymethyl methacrylate and its production method, which is applied in X-ray/γ-ray/particle irradiation therapy, material analysis, material analysis using wave/particle radiation, etc. It can solve the problem of low device structure depth and surface roughness Low, large structure depth and other issues, to achieve the effect of small material restrictions, good focal spot quality, and reduced X-ray absorption
CN1327250CInactive Publication Date: 2007-07-18乐孜纯
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
乐孜纯
Publication Date
2007-07-18
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to poly methyl methacrylate material one dimension X ray diffraction refraction microstructure device manufacturing method. It includes the following steps: making photolithography mask edition; processing silicon substrate; coating polyimide and baking and solidifying; producing metallic film to use as electro forming cathode; coating thick photoresist; exposing, developing, and hardening; producing metallic film to use as X ray photolithography mask absorbent; removing the photoresist an electro forming cathode; back photoengraving and silicon corroding; making titanium slice as supporting; coating poly methyl methacrylate, backing, and solidifying; X ray photoengraving and developing.
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Description

(1) Technical field

[0001] The invention relates to an X-ray microstructure optical device, in particular to a manufacturing process of a microstructure X-ray optical device based on the dual effects of refraction and diffraction, and is suitable for polymethyl methacrylate organic material one-dimensional X-ray refractive diffraction microstructure device Production occasion. (2) Technical background

[0002] The X-ray combination lens is a kind of X-ray microstructure optical device based on refraction effect, which is suitable for high-energy X-ray wave band (that is, the X-ray radiation energy exceeds 5keV) proposed by A. Snigirev in 1996. It has the advantages of no need to deflect the light path, good high temperature stability and easy cooling, simple and compact structure, and low requirements on the surface roughness of the lens. It has broad application prospects in the field of ultra-high resolution X-ray diagnostic science and technology. In recent years, research on ...

Claims

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