Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Process for mfg. one-dimensional X ray refracted diffraction micro structural component of polymethyl methyl acrylate material

A technology of polymethyl methacrylate and its production method, which is applied in X-ray/γ-ray/particle irradiation therapy, material analysis, material analysis using wave/particle radiation, etc. It can solve the problem of low device structure depth and surface roughness Low, large structure depth and other issues, to achieve the effect of small material restrictions, good focal spot quality, and reduced X-ray absorption

Inactive Publication Date: 2007-07-18
乐孜纯
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problems of low device structure depth, large material restrictions, and high roughness in the existing manufacturing technology, and provide a polymethyl methacrylate with large device structure depth, small material restrictions, and low surface roughness. Fabrication method of material one-dimensional X-ray diffraction microstructure device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for mfg. one-dimensional X ray refracted diffraction micro structural component of polymethyl methyl acrylate material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1, a method for manufacturing a one-dimensional X-ray diffraction microstructure device of polymethyl methacrylate material, the one-dimensional X-ray diffraction microstructure device includes a plurality of lens units arranged coaxially in sequence The lens unit is composed of a lens body with an air gap, and the upper side wall of the lens body is provided with upward stepped steps, and the step width of each step is equal; the lower side wall of the lens body is opened There are downward stepped steps arranged symmetrically with the steps of the upper side wall of the lens with the axis as the center line, the lens body is provided with an open air gap, the cross-sectional shape of the air gap is semi-elliptical, and the air gap The maximum aperture size corresponding to the minor axis of the ellipse is smaller than the minor axis of the ellipse, the major axis of the elliptical air gap of the lens unit is located on the same straight line, and the manufacturing method ...

Embodiment 2

[0044] In the technical solution of this embodiment, the thickness of the polyimide material in step (C) is 5 microns, the metal material electroformed cathode film in step (D) is titanium material, and the surface of the titanium sheet is coated in step (K) The thickness of the coated polymethyl methacrylate is 500 microns, and the rest of the steps are the same as in Example 1.

Embodiment 3

[0046] In the technical scheme of this embodiment, the metal material electroformed cathode film described in step (D) is titanium material with a thickness of 400 nanometers, and in step (K), the thickness of the polymethyl methacrylate coated on the surface of the titanium sheet is 800 Micron, the remaining steps are the same as in Example 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to poly methyl methacrylate material one dimension X ray diffraction refraction microstructure device manufacturing method. It includes the following steps: making photolithography mask edition; processing silicon substrate; coating polyimide and baking and solidifying; producing metallic film to use as electro forming cathode; coating thick photoresist; exposing, developing, and hardening; producing metallic film to use as X ray photolithography mask absorbent; removing the photoresist an electro forming cathode; back photoengraving and silicon corroding; making titanium slice as supporting; coating poly methyl methacrylate, backing, and solidifying; X ray photoengraving and developing.

Description

(1) Technical field [0001] The invention relates to an X-ray microstructure optical device, in particular to a manufacturing process of a microstructure X-ray optical device based on the dual effects of refraction and diffraction, and is suitable for polymethyl methacrylate organic material one-dimensional X-ray refractive diffraction microstructure device Production occasion. (2) Technical background [0002] The X-ray combination lens is a kind of X-ray microstructure optical device based on refraction effect, which is suitable for high-energy X-ray wave band (that is, the X-ray radiation energy exceeds 5keV) proposed by A. Snigirev in 1996. It has the advantages of no need to deflect the light path, good high temperature stability and easy cooling, simple and compact structure, and low requirements on the surface roughness of the lens. It has broad application prospects in the field of ultra-high resolution X-ray diagnostic science and technology. In recent years, research on ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B3/00G03F7/20G01N23/083A61N5/10
Inventor 乐孜纯梁静秋董文全必胜
Owner 乐孜纯
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com