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A high-frequency-band dielectric material characteristic measurement method

A technology of dielectric materials and measurement methods, applied in special data processing applications, design optimization/simulation, etc., can solve the problems of expensive spread spectrum modules of terahertz vector network analyzers, and achieve controllable test costs, convenient and accurate acquisition, and low cost cheap effect

Active Publication Date: 2021-09-24
CHINA ELECTRONICS TECH GRP CORP NO 14 RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The network parameter method is to use the vector network analyzer to measure the reflection or scattering matrix of the dielectric material, and then calculate the electromagnetic parameters of the measured material according to the corresponding algorithm, but the spread spectrum module of the high frequency millimeter wave and terahertz vector network analyzer is very expensive

Method used

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  • A high-frequency-band dielectric material characteristic measurement method
  • A high-frequency-band dielectric material characteristic measurement method

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Embodiment 1

[0027] An embodiment of the present invention is a method for measuring the characteristics of a high-frequency dielectric material, comprising the following steps:

[0028] 1. Establish in the three-dimensional full-wave electromagnetic simulation software (such as HFSS, CST Microwave Studio, etc.) figure 1 The lens antenna model shown, and its first simulation.

[0029] The lens antenna model includes an illumination feed 1 , a support structure 2 and a lens 3 made of high-frequency dielectric material. Preferably, in another embodiment, the illumination feed 1 is a rectangular horn antenna with a medium gain (gain of 10-15dBi), which is used to confine the energy transmitted from the standard rectangular waveguide to radiate space. The supporting structure 2 is a hollow cavity whose main function is to fix the relative positional relationship between the illumination feed source 1 and the lens 3 , and may be a hollow cavity such as a cuboid or a cylinder, for example. The...

Embodiment 2

[0035] In another embodiment, the high-frequency dielectric material to be measured is polytetrafluoroethylene, and its test frequency range is 216±1 GHz. The lens 3 is processed into a lens form with a thick middle and a thin periphery by using the dielectric material, and is installed at the tail of the support structure 2 . The support structure 2 and the irradiation feed source 1 are designed and processed with copper materials. The length of the support structure 2 along the beam irradiation direction is 58mm, and the size of the mouth surface of the installation lens 3 is 33mm×19mm. The gain of illumination feed 1 is designed to be 15dBi, and the input electrical interface is WR-4 waveguide international standard interface. The lens 3 made of the high-frequency dielectric material to be measured further focuses the electromagnetic wave emitted by the irradiation feed 1 to increase the overall gain of the lens antenna and improve the accuracy of the medium measurement. T...

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Abstract

The invention discloses a high-frequency-band dielectric material characteristic measurement method, and belongs to the technical field of microwave antenna material characteristic measurement. The method includes building a lens antenna model in three-dimensional full-wave electromagnetic simulation software, performing primary simulation on the lens antenna model, obtaining a group of far-field radiation pattern test parameters, and wherein a lens of the lens antenna model is made of a to-be-tested high-frequency-band dielectric material; manufacturing a lens antenna according to the lens antenna model, and performing actual far-field radiation pattern test to obtain actual far-field radiation pattern test parameters; performing post-simulation, only changing the dielectric constant and the loss angle tangent in the lens antenna model, and performing simulation to obtain N groups of far-field radiation pattern test parameters of the lens antenna model; and comparing the post-simulation result with actual far-field radiation pattern test parameters to obtain dielectric constants and loss tangent values corresponding to a group of simulation values closest to the actual measurement result. According to the invention, the dielectric material characteristics of the high-frequency-band dielectric material sample to be measured can be conveniently and accurately obtained, and the cost is low.

Description

technical field [0001] The invention belongs to the technical field of material property measurement, and in particular relates to a method for measuring high-frequency dielectric material properties. Background technique [0002] In recent years, with the increasing application of low-frequency microwave bands, its spectrum resources have tended to be saturated. At the same time, the rise of applications such as 5G high-speed communication and automotive radar has also put forward new requirements for the research of radio frequency systems and antennas in the high-frequency microwave band and millimeter wave terahertz band. In the design of high-frequency radio frequency systems and antennas, the measurement and determination of the material properties of the dielectric materials used have a very important impact on the performance of radio frequency systems and antennas. [0003] The existing methods for measuring the properties of dielectric materials in the microwave a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/20
CPCG06F30/20
Inventor 成立吴福伟李元吉杨予昊孙俊
Owner CHINA ELECTRONICS TECH GRP CORP NO 14 RES INST
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