Lithographic equipment and silicon wafer pre-alignment method

Abstract

The invention provides photoetching equipment and a silicon wafer pre-alignment method. A silicon wafer pre-alignment device comprises a bottom plate, a translation unit, a lifting unit, a rotating unit and an optical acquisition system. The rotating unit and the lifting unit are independently arranged, rotating motion and lifting motion are separated, and the motion stroke efficiency is improved. The rotating unit is arranged on the translation unit, and the translation unit drives the rotating unit to translate, so that on one hand, eccentricity compensation of the silicon wafer is realized; on the other hand, the transverse distance between the rotating unit and the optical acquisition system is adjustable so as to adapt to different silicon wafer sizes. The lifting motion and the rotating motion are parallel, the pre-alignment process string changing motion is partially parallel, the process time is shortened, and the efficiency is improved. The lifting unit drives a second suction cup to do lifting motion, so that the vertical distance between a first suction cup on the rotating unit and the second suction cup on the lifting unit is adjustable, more working conditions can be met, and the connection efficiency and flexibility of corresponding stations of the rotating unit and the lifting unit are improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment, and in particular relates to a photolithography equipment and a silicon chip pre-alignment method. Background technique [0002] A lithographic apparatus is a machine that applies a predetermined pattern to a silicon wafer substrate. Photolithographic equipment is widely used in the manufacture of integrated circuits (ICs). During the production process of the lithography process, the silicon wafer needs to be transferred to the workpiece table of the lithography equipment with high centering and orientation accuracy through a silicon wafer transmission mechanism (such as a robot arm), so that the silicon wafer can be fixed in a fixed position. pose for exposure. Since the position and direction of the silicon wafer are uncertain when it is initially placed, it is required to pre-align the silicon wafer with a certain precision before the silicon wafer is transferred to the work...

AI Technical Summary

Problems solved by technology

[0004] The rotation axis R and the lifting axis Z are set coaxially, and they are restrained from each other and cannot move independently. The flexibility is poor, which affects the movement travel time and the efficiency of station handover; the pre-alignment is serial Process, time-consuming and low efficiency

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