Soothing and repairing mask essence containing camellia japonica extract and preparation method and application thereof

A camellia extraction and essence technology, which is applied in the field of skin care products, can solve the problems of single functional components of the mask, chemical residues, skin damage, etc., and achieve the effects of improving the basic metabolism of the skin, strengthening the skin, and protecting the skin

Pending Publication Date: 2021-10-12
QINGDAO INST OF BIOENERGY & BIOPROCESS TECH CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the technical problem of skin lesion damage caused by chemical residue after long-term use of the current commercially available facial mask an...

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0031] Specific embodiment one: a kind of soothing and repairing mask essence containing camellia extract of the present embodiment consists of 6% camellia extract, 3% honeysuckle flower extract, 1% astaxanthin, and purslane extract by mass fraction 3%, rosemary leaf oil 2%, rosemary extract 4%, glycerin 10%, butylene glycol 8%, betaine 0.5%, squalane 1%, octacosanol 1%, spermaceti Stearyl Olivate 0.5%, Sorbitan Olivate 0.3%, Allantoin 0.06%, Sodium Hyaluronate 0.8%, Sodium Alginate 1%, Ethylhexylglycerin 0.2%, Caprylyl Glycol 0.2% , 1.3% hydroxyethyl cellulose, 0.01% p-hydroxyacetophenone and the balance deionized water.

[0032] The preparation method of the above-mentioned soothing and repairing mask essence containing camellia extract is carried out in the following steps:

[0033] 1. Dissolve camellia extract, honeysuckle flower extract, astaxanthin, purslane extract, rosemary leaf oil, rosemary extract, squalane and octacosanol in water according to the mass ratio , he...

specific Embodiment approach 2

[0038] Specific embodiment two: a kind of soothing and repairing mask essence containing camellia extract of the present embodiment is composed of camellia extract 4%, honeysuckle flower extract 5%, astaxanthin 1.5%, purslane extract 2% by mass fraction %, rosemary leaf oil 4%, rosemary extract 2%, glycerin 15%, butylene glycol 4%, betaine 0.1%, squalane 0.5%, octacosanol 2%, cetearyl Fatty Alcohol Olivate 0.3%, Sorbitan Olivate 0.5%, Allantoin 0.01%, Sodium Hyaluronate 0.4%, Sodium Alginate 0.5%, Ethylhexylglycerin 0.1%, Caprylyl Glycol 0.1%, Prepared from 1.0% hydroxyethyl cellulose, 0.03% p-hydroxyacetophenone and the rest deionized water.

[0039] The preparation method of the above-mentioned soothing and repairing mask essence containing camellia extract is carried out in the following steps:

[0040] 1. Dissolve camellia extract, honeysuckle flower extract, astaxanthin, purslane extract, rosemary leaf oil, rosemary extract, squalane and octacosanol in water according to...

specific Embodiment approach 3

[0045] Specific embodiment three: a kind of soothing and repairing mask essence containing camellia extract of the present embodiment is by mass fraction 5% of camellia extract, 4% of honeysuckle flower extract, 1.25% of astaxanthin, and 2.5% of purslane extract , rosemary leaf oil 3%, rosemary extract 34%, glycerin 12.5%, butylene glycol 6%, betaine 0.3%, squalane 0.75%, octacosanol 1.5%, cetearyl Alcohol Olivate 0.4%, Sorbitan Olivate 0.4%, Allantoin 0.04%, Sodium Hyaluronate 0.6%, Sodium Alginate 0.75%, Ethylhexylglycerin 0.15%, Caprylyl Glycol 0.15%, Hydroxy Prepared from ethyl cellulose 1.2%, p-hydroxyacetophenone 0.02% and the balance deionized water.

[0046] The preparation method of the above-mentioned soothing and repairing mask essence containing camellia extract is carried out in the following steps:

[0047] 1. Dissolve camellia extract, honeysuckle flower extract, astaxanthin, purslane extract, rosemary leaf oil, rosemary extract, squalane and octacosanol in wat...

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PUM

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Abstract

The invention discloses soothing and repairing mask essence containing a camellia japonica extract and a preparation method and application thereof. The mask essence and preparation method and application thereof belongs to the field of skin care products. The mask essence and preparation method and application thereof aim to solve the technical problems of skin damage caused by chemical residues after long-term use of current commercially available masks and single functional component of the commercially available masks. The mask essence is prepared from a camellia japonica extract, a honeysuckle flower extract, astaxanthin, a herba portulacae extract, rosemary leaf oil, a rosemary extract, glycerin, butanediol, betaine, squalane, octacosanol, cetostearyl olivate, sorbitan olivate, allantoin, sodium hyaluronate, sodium alginate, ethylhexylglycerin, caprylyl glycol, hydroxyethyl cellulose, p-hydroxyacetophenone and water. The mask essence is rich in various plant essence components, and has the effects of soothing skin, astringing and moisturizing, improving skin glossiness and the like.

Description

technical field [0001] The invention belongs to the field of skin care products, and in particular relates to a soothing and repairing facial mask essence containing camellia extract, a preparation method and application thereof. Background technique [0002] Facial mask is an enhanced skin care product, which is easy to carry, easy to use, has little side effects on the skin, and has significant effects. At present, facial mask has become one of the fastest growing market segments in my country's daily chemical industry, with good development prospects. It is widely used in the field of cosmetics. accounted for an increasing share. With the acceleration of the pace of life in modern society, facial masks are more acceptable to female users. [0003] The skin care principle of the mask is to temporarily isolate the outside air and pollution during the short time it covers the face, increase the surface temperature of the skin, expand the pores of the skin, promote the secret...

Claims

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Application Information

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IPC IPC(8): A61K8/9789A61K8/92A61K8/34A61K8/35A61K8/31A61K8/02A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/9789A61K8/922A61K8/342A61K8/35A61K8/31A61K8/345A61K8/0212A61Q19/005A61Q19/00A61Q19/02A61Q19/08A61Q19/007A61K2800/5922A61K2800/592A61K2800/524
Inventor 王建勋咸漠荀明月侯同刚董晴晴刘仲舒杜文宣张同
Owner QINGDAO INST OF BIOENERGY & BIOPROCESS TECH CHINESE ACADEMY OF SCI
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