Manufacturing process and equipment of rotary target material
A manufacturing process and technology of rotating targets, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low impurity content of rotating targets, difficulty in obtaining uniform alloy rotating targets, high density, etc.
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Embodiment 1
[0076] This embodiment provides a zinc-tin rotating target, which is prepared according to the following preparation process:
[0077] (1) Make the lifting platform 175 carry the molten pool 130 with the mold down to the lowest position; insert the liner pipe 001 vertically into the molten pool 130, and pass through the crystallizer fixed at the bottom opening of the molten pool 130 out, and ensure concentricity with the crystallizer, the two ends of the inner liner 001 are clamped by the upper clamp 181 and the lower clamp 182 in the liner fixing device.
[0078] (2) Heat the lining pipe 001 and the molten pool 130 to 375°C, keep warm, and wait for casting; select Zn metal blocks with a purity of 99.99% and Sn metal blocks with a purity of 99.99%. Considering that Sn is easier to oxidize than Zn, ZnSn alloy Weigh Zn metal block and Sn metal block according to Zn49.5%, Sn50.5% by weight, put into melting furnace 110 to melt, and heat the temperature of the molten metal to 30°C...
Embodiment 2
[0082] This embodiment provides a zinc-tin rotating target, the process of which is basically the same as that of Embodiment 1, the difference is that in this embodiment, the melting furnace 110 heats the temperature of the molten metal to 50°C above the liquidus line; the lifting platform 175 walks upwards at a speed of 2.5cm / min.
Embodiment 3
[0084] This embodiment provides a zinc-tin rotating target, the process of which is basically the same as that of Embodiment 1, the difference is that in this embodiment, the melting furnace 110 heats the temperature of the molten metal to 70°C above the liquidus line; the lifting platform 175 walks upwards at a speed of 3cm / min.
[0085] In summary, the manufacturing process and equipment of the rotating target in the embodiment of the present application are used to manufacture a rotating target with high purity and uniform composition.
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