Resistance-capacitance coupling quick-opening silicon controlled electrostatic protection device and manufacturing method thereof
An electrostatic protection device, resistance-capacitance coupling technology, applied in the direction of electrical solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of SCR high trigger voltage, easy to exceed the design window, low maintenance voltage, etc., to achieve increased maintenance voltage, good isolation, and avoidance of latch-up
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0045] Such as image 3As shown, a thyristor electrostatic protection device with resistance-capacitance coupling quickly turned on includes a P-type substrate 101; an N-type buried layer 201 is arranged in the substrate; above the N-type buried layer is a first N-type Deep well 301, second N-type deep well 302, P-type epitaxial layer substrate 102; N well 403 is on the second N-type deep well; There is a second P well 402 on the P-type epitaxial layer P-EPI The second P well is provided with a second P+ implantation region 502 and an embedded N-type MOS transistor, wherein the embedded N-type MOS transistor includes a first N+ implantation region 503, a second N+ implantation region 504 and a gate region 701, The second N+ implantation region 504 spans the second P well 402 and N well 403; the source and drain ends of the embedded N-type MOS transisto...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


