Extended range vacuum measurement chip and its forming method
A technology for vacuum measurement and expansion, which is used in liquid/vacuum measurement for liquid tightness, vacuum gauges, measuring devices, etc., and can solve the problems of process control lag, small dynamic range, and limited measurement range.
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[0048] The technical solutions of the present invention will be clearly and completely described below in conjunction with the embodiments. Obviously, the described embodiments are part of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0049] Such as figure 1 and Figure 11 As shown, the embodiment of the present invention provides an extended range vacuum measurement chip, which specifically includes:
[0050] Substrate 100, the substrate 100 includes a heat-insulating cavity 110; the material of the substrate 100 is preferably but not limited to silicon, wherein part of the silicon material can be removed from the back of the substrate 100 by standard MEMS plasma ion deep etching to form the above-mentioned thermal-insulating cavity 110. The therm...
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