Quantum dot substrate manufacturing method and quantum dot substrate

Abstract

The embodiment of the invention discloses a manufacturing method of a quantum dot substrate and the quantum dot substrate. The manufacturing method of the quantum dot substrate comprises the following steps: arranging frame glue on a first substrate or a second substrate, arranging a plurality of grooves in one side of the first substrate, arranging a first electrode at the bottoms of the grooves, and arranging a second electrode at one side of the second substrate; adding a quantum dot solution with quantum dots to the inner side of the frame glue; bonding the first substrate and the second substrate together through frame glue, and forming a reaction cavity by the first substrate, the second substrate and the frame glue, wherein a first electrode, a second electrode and a quantum dot solution are arranged in the reaction cavity; applying a voltage to the first electrode and the second electrode, so an electric field is formed between the first electrode and the second electrode, wherein quantum dots are deposited on the first electrode through the electric field, so a quantum dot layer is formed on the first electrode; the technical problems of low luminous efficiency, poor stability, low precision and poor repeatability of the quantum dot layer can be solved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a manufacturing method of a quantum dot substrate and the quantum dot substrate. Background technique [0002] Quantum Dot (QD) is a nano-scale semiconductor material with quantum effect; it can emit fluorescence of different colors under the excitation of electricity or light. The color gamut of the quantum dot display technology can reach 110% of the NTSC color gamut, so the quantum dot material can endow the display with a wider color gamut, making the terminal display have more beautiful color performance. [0003] At present, the processing methods of the quantum dot layer are mainly photolithography and inkjet printing. The photolithography method is to disperse the quantum dots in the photoresist, then coat them on the substrate, and then obtain the patterned quantum dot layer by exposure and development. , the surface chemical environment of quantum dots is co...

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Problems solved by technology

[0004] The embodiment of the present application provides a method for manufacturing a quantum dot substrate and a quantum dot substrate, which can solve the technical problems of low luminous efficiency, poor stability, low precision and poor repeatability of the quantum dot layer

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