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Metrology tools comprising aplanatic objective singlet

A planar aberration and tool technology, applied in the field of optical detection system, can solve the problems of complex optical system, increasing the complexity of optical system, large size of optical system, etc.

Pending Publication Date: 2022-01-07
ASML NETHERLANDS BV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

These optical systems can be very complex in order to meet the stringent performance requirements placed on the devices forming part of the optical systems
The performance of an optical system is often wavelength dependent, and fabricating optics that meet performance requirements over a wider wavelength range may also increase the complexity of the optical system
As a result, the optical system inside the device can be large in size and / or cost and can be difficult to produce

Method used

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  • Metrology tools comprising aplanatic objective singlet
  • Metrology tools comprising aplanatic objective singlet
  • Metrology tools comprising aplanatic objective singlet

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Embodiment Construction

[0051] In this document, the terms "radiation" and "beam" are used to cover all types of electromagnetic radiation, including ultraviolet radiation (e.g., at a wavelength of 365 nm, 248 nm, 193 nm, 157 nm or 126 nm) and EUV (extreme wavelengths in the range of about 5 nm to 100 nm).

[0052] The terms "reticle," "mask," or "patterning device" as employed herein may be broadly interpreted to refer to a general patterning device that can be used to impart a patterned cross-section to an incident beam, the patterned cross-section corresponds to the pattern to be produced in the target portion of the substrate. In this context, the term "light valve" may also be used. In addition to classical masks (transmissive or reflective, binary, phase-shifted, hybrid, etc.), examples of other such patterning devices include programmable mirror arrays and programmable LCD arrays.

[0053] figure 1 A lithographic apparatus LA is schematically depicted. The lithographic apparatus LA compris...

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Abstract

A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has an aplanatic wavelength which is within the wavelength range.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European / US application 19175086.8 filed on May 17, 2019, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to metrology tools for determining one or more properties of structures on a substrate. In particular, the present invention relates to an optical detection system comprising an aplanatic single objective within such a metrology tool. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern onto a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus can, for example, project a pattern (often also referred to as a "design layout" or "design") at a patterning device (e.g., a mask) onto a radiation-sensitive material (anti- etchant) layer. [0005] To project a pattern on a substrat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/00
CPCG03F7/70616G02B27/0012G02B3/04G03F7/7015G03F7/70633G03F7/20H01L21/0274G01N21/95607
Inventor F·泽普
Owner ASML NETHERLANDS BV