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Mass flow controller and flow adjusting mechanism thereof

A technology of flow controller and flow adjustment, which is applied in the direction of valve details, valve casing structure, mechanical equipment, etc., can solve the problems of poor sealing effect, poor applicability, low production capacity, etc., to reduce internal leakage rate, improve use efficiency, improve The effect of applicability

Pending Publication Date: 2022-01-25
BEIJING SEVENSTAR FLOW CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the shortcomings of the existing methods, this application proposes a mass flow controller and its flow regulating mechanism to solve the technical problems of low production capacity, poor sealing effect or poor applicability in the prior art

Method used

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  • Mass flow controller and flow adjusting mechanism thereof
  • Mass flow controller and flow adjusting mechanism thereof
  • Mass flow controller and flow adjusting mechanism thereof

Examples

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Embodiment Construction

[0026] The present application will be described in detail below, and examples of the embodiments of the present application are illustrated in the drawings, in which the same or similar reference numerals represent the same or similar components or components having the same or similar functions. Further, it is omitted if the detailed description of the known techniques is unnecessary to the features of the present application. The following is exemplary, and is intended to explain the present application by referring to the embodiments described with reference to the accompanying drawings.

[0027] Those skilled in the art will appreciate that all terms (including technical terms and scientific terms) used herein, unless otherwise defined. It should also be understood that those terms defined in a general dictionary should be understood to have meaningful meaning with the meaning of the context of the prior art, and unless it is a particular definition as it is, it will not be d...

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Abstract

Embodiments of the invention provide a mass flow controller and a flow adjusting mechanism thereof. The flow adjusting mechanism comprises a valve seat component, a valve body component and a driving component, wherein the valve seat component comprises a valve seat and a valve port, a fluid channel is formed in the valve seat and provided with a radial opening, and the bottom end of the valve port is in sealed connection with the radial opening; the valve body component comprises a valve body and a valve core, the valve body is arranged on the valve seat, a sliding groove is formed in one end of the valve body, and an opening of the sliding groove is communicated with the valve port; the valve core is arranged in the sliding groove in a sliding mode and used for adjusting the opening degree of the valve port; and the driving component comprises a driving part and a transmission rod, the driving part is arranged at the top of the valve body, the two ends of the transmission rod are connected with the driving part and the valve core respectively, and the driving part drives the valve core to ascend and descend in the sliding groove through the transmission rod so as to adjust the opening degree of the valve port. According to the embodiments of the invention, the difficulty in machining and manufacturing is effectively reduced, and the requirements of quick and accurate response of a mass flow controller can be met.

Description

Technical field [0001] The present application relates to the field of flow control technology, and in particular, the present application relates to a mass flow controller and its flow regulating mechanism. Background technique [0002] Currently, gas mass flow controller (MFC) is used to precisely measure and control gas mass flow. There is an important application in scientific research and production in semiconductors and integrated circuit crafts, special materials disciplines, chemical industry, petroleum industry, medicine, environmental protection and vacuum. Typical applications include semiconductor process devices, for example, in processes such as diffusion, oxidation, epitaxial, chemical vapor deposition, plasma etching, sputtering, ion implantation, and coating equipment, fiber smelting, microreactive devices, mixing Gas system, gas sampling, capillary measurement, gas chromatograph and other analytical instruments. [0003] The mass flow controller in the prior art...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F16K17/20F16K17/22F16K31/04F16K27/02F16K37/00
CPCF16K17/20F16K17/22F16K31/04F16K27/02F16K37/005
Inventor 王利源苏乾益宋志辉
Owner BEIJING SEVENSTAR FLOW CO LTD
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