Device for carrying out high-throughput direct writing by using thousand beams of independent controllable PPI dot matrixes

Abstract

The invention discloses a device for carrying out high-throughput direct writing by using thousand beams of independent controllable PPI dot matrixes, and the device mainly comprises excitation light and suppression light; the excitation light path comprises a core element digital micromirror array DMD, a microlens array MLA and a continuous deformable mirror DM, and the suppression light path comprises a core element spatial light modulator SLM. The micro-lens array MLA is used for generating a thousand-beam exciting light dot matrix, the high-speed continuous deformable mirror DM is used for correcting system wavefront aberration, dot matrix distribution uniformity and light spot quality optimization are achieved, the digital micro-mirror array DMD is used for independently regulating and controlling opening, closing and intensity of the dot matrix, a light path is restrained from generating four beams of light through the spatial light modulator SLM, dot matrix dark spots generated by interference of the four beams of light on the focal plane of the objective lens are used for vortex suppression light and coincide with the exciting light dot matrix on the focal plane of the objective lens to form thousand beams of PPI dot matrixes, and super-resolution high-flux flexible inscribing of a large-area complex three-dimensional structure can be achieved.

Description

technical field [0001] The invention belongs to the field of micro-nano processing, and more specifically relates to a device and method for high-throughput direct writing using thousands of independently controllable PPI lattices. Background technique [0002] Laser direct writing technology is moving towards industrial application. It is necessary to greatly increase the processing throughput while ensuring the writing accuracy, and at the same time solve the problem of single writing structure, so as to realize high-throughput and high-precision writing of complex three-dimensional structures. [0003] The vortex light is superimposed on the basis of the solid excitation light to suppress the polymerization reaction caused by the periphery of the excitation light. This method is the Peripheral Photoinhibition (PPI) technology, which can greatly improve the writing accuracy. [0004] The processing throughput can be improved by increasing the parallel number of PPI lattice...

AI Technical Summary

Problems solved by technology

[0004] The processing throughput can be improved by increasing the parallel number of PPI lattices, but currently the number of vortex beams generated by vortex phase plates, spatial light modulators SLM, digital micromirror devices DMD, etc. is very limited, which limits the technology based on PPI. The processing throughput is high, and the method of using beam interference to form a dot matrix dark spot array as a vortex light can greatly increase the parallel number of PPI, but the writing structure is single

Literature (Optics Letters, 2020, 45(10): 2712-2715) uses the lattice dark spots generated by four-beam interference as a vortex light array, and overlaps with the expanded solid excitation light to obtain 1225 parallel STED beams. Simultaneously realize The spatial resolution of 35nm is achieved; because the excitation light in the scheme is directly expanded and overlaps with the vortex lattice, it is impossible to independently switch and control the light spots of each unit in the excitation light lattice. This scheme is used for super-resolution microscopy imaging, citing the From the scheme to the lithography system, although the processing throughput can be significantly improved, it can only process periodic structures, which cannot meet the writing requirements of complex structures.

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