Large-area patterned micro-nano particle self-assembly structure and preparation method thereof

Abstract

The invention discloses a large-area patterned micro-nano particle self-assembly structure and a preparation method thereof, and the method comprises the following steps: (1) adding a dispersion liquid containing hydrophobic micro-nano particles into water so as to form a micro-nano particle film on a liquid-gas interface; (2) transferring the micro-nano particle film to the patterned template; (3) forming an adhesion layer on a substrate, then transferring the patterned template with the micro-nano particle film obtained in the step (2) to the substrate containing the adhesion layer, applying pressure, wherein the micro-nano particle film makes contact with the adhesion layer; and (4) removing the adhesion layer on the outer edge of the structure obtained in the step (3) so as to obtain the large-area patterned micro-nano particle self-assembly structure. Therefore, the method has the advantages that the preparation speed is high, the area of the prepared patterned micro-nano particle self-assembly structure is large, the preparation precision is high, the shape controllability is high, and the preparation stability is high.

Description

technical field [0001] The invention belongs to the technical field of preparation of micro-nano particle self-assembly structure, and in particular relates to a large-area patterned micro-nano particle self-assembly structure and a preparation method thereof. Background technique [0002] Due to the size effect, spherical micro-nanoparticles show advantages that macroscopic materials do not have in many aspects such as light, electricity, magnetism, force, and heat, so they have attracted extensive attention from researchers at home and abroad. Realizing the precise arrangement of micro-nano particles and forming a special patterned structure is the basis for preparing functional devices with special optical properties, anti-counterfeiting / encryption functions, and specific wettability. [0003] At present, the methods for forming patterned micro-nanoparticle self-assembly structures are mainly divided into step speed-controlled pulling / convective self-assembly, template-as...

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Problems solved by technology

The pulling / convective self-assembly controlled by step speed can be controlled to form a special stripe-like periodic pattern self-assembly structure for nanoparticles at the position of the three-phase contact line by controlling the substrate movement speed during the pulling / convective self-assembly process. , but affected by its preparation mechanism, this method can only form striped self-assembled structures

Template-assisted pulling / convective self-assembly can form a patterned self-assembled structure in a special area during the pulling / convective self-assembly process by preparing patterned pits or protrusions on the surface of the base, but it is affected by the pulling / convective self-assembly process. Limited by the slow preparation speed of flow self-assembly, this method can only prepare small-area patterned self-assembled structures

Laser-induced convective self-assembly and optical tweezers induce nanoparticles to form a self-assembled structure in a special area by moving the spot position, but this method usually requires complex and sophisticated equipment, and the preparation process is slow and the preparation area is very limited.

Although the self-assembled structure of patterned micro-nanoparticles has been developed in recent years, there are still significant problems such as slow preparation speed, small preparation area, and poor preparation accuracy, which seriously limit the rapid development of this field.

[0004] Therefore, the preparation method of the existing patterned micro-nanoparticle self-assembled structure needs to be improved

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